2019
DOI: 10.1038/s41467-019-12056-1
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Carrier lifetime enhancement in halide perovskite via remote epitaxy

Abstract: Crystallographic dislocation has been well-known to be one of the major causes responsible for the unfavorable carrier dynamics in conventional semiconductor devices. Halide perovskite has exhibited promising applications in optoelectronic devices. However, how dislocation impacts its carrier dynamics in the ‘defects-tolerant’ halide perovskite is largely unknown. Here, via a remote epitaxy approach using polar substrates coated with graphene, we synthesize epitaxial halide perovskite with controlled dislocati… Show more

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Cited by 100 publications
(103 citation statements)
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“…For the former, typical transparent oxide substrates and other charge transporting bottom contact layers used for devices cannot direct the growth of the perovskite film. Single crystalline chunks of halide perovskites and epitaxially grown thin films on single crystal substrate have been demonstrated [7][8][9][10][11] , but thicknesscontrolled layer transfer of the grown materials onto a desired substrate has not been successful. For the latter, inherently fast reaction kinetics during the typical solution process causes numerous nuclei to form in the bulk solution, resulting in the growth of randomly oriented fine grains with a high density of defects.…”
mentioning
confidence: 99%
“…For the former, typical transparent oxide substrates and other charge transporting bottom contact layers used for devices cannot direct the growth of the perovskite film. Single crystalline chunks of halide perovskites and epitaxially grown thin films on single crystal substrate have been demonstrated [7][8][9][10][11] , but thicknesscontrolled layer transfer of the grown materials onto a desired substrate has not been successful. For the latter, inherently fast reaction kinetics during the typical solution process causes numerous nuclei to form in the bulk solution, resulting in the growth of randomly oriented fine grains with a high density of defects.…”
mentioning
confidence: 99%
“…Epitaxial growth has been demonstrated to be an effective technique for preparing high‐quality semiconductor films with preferred orientations. [ 14–16 ] Epitaxial growth of perovskite films have been studied by several groups. For example, Wang et al.…”
Section: Introductionmentioning
confidence: 99%
“…While epitaxy from vapors is standard for conventional inorganic semiconductors such as silicon, germanium, or III/V compounds, [ 22–26 ] it has been recently also obtained for MHPs. [ 27,28 ] Chemical vapor deposition of CH 3 NH 3 PbCl 3 on mica substrates [ 29 ] and CsPbBr 3 on SrTiO 3 [ 30 ] was successfully shown, as well as molecular beam epitaxy of CsSnBr 3 on NaCl substrates. [ 27 ] Coherent and continuous films were demonstrated in an interesting attempt called “remote epitaxy,” using polar substrates coated with graphene, to obtain epitaxial halide perovskite films with improved carrier lifetimes.…”
Section: Introductionmentioning
confidence: 99%
“…[ 27 ] Coherent and continuous films were demonstrated in an interesting attempt called “remote epitaxy,” using polar substrates coated with graphene, to obtain epitaxial halide perovskite films with improved carrier lifetimes. [ 28 ] A special feature of the metal‐halide‐perovskite is that they allow processing from solutions. Therefore, the spin coating was introduced to obtain in particular CH 3 NH 3 PbI 3 crystallites on KCl substrates, exhibiting superior light detectivity as compared to any other crystalline or a polycrystalline structure from the same material.…”
Section: Introductionmentioning
confidence: 99%