Carburizing of zirconium using a low energy Mather type plasma focus

Murtaza, G.; Hussain, Shafqat; Rehman, Najeeb Ur; Naseer, S.; Shafiq, Muhammad; Zakaullah, M.

doi:10.1016/j.surfcoat.2010.11.015

Cited by 33 publications

(16 citation statements)

References 46 publications

(52 reference statements)

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“…GPa [10,44,45], this difference comes from the difference in microstructure between bulk zirconium characterized by large grains and the film consists of nanometer-sized grains in agreement with Hall-Petch relationship. During the growth, the zirconium film undergoes a particles bombardment, which contributes to the increase of the stress state and subsequently the film hardness.…”

Section: Surface Mechanical Propertiessupporting

confidence: 56%

“…Zirconium is widely employed in industrial devices being used in aerospace, optoelectronics, and chemistry [9]. Its high melting point and low thermal neutrons capture cross section allows it to be used in nuclear reactor installations [8,10]. Zirconium is applied as an alloy or ceramic in medical implants because it is biocompatible in the human body [11].…”

Section: Introductionmentioning

confidence: 99%

“…Zirconium is applied as an alloy or ceramic in medical implants because it is biocompatible in the human body [11]. The carbide form, ZrC, is widely employed in industry because of its good properties (thermal, chemical, optoelectronical), and excellent corrosion and wear resistances [10,[12][13][14].…”

Section: Introductionmentioning

confidence: 99%

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Study of the interaction between a zirconium thin film and an EN C100 steel substrate: Temperature effect

Benouareth

Tristant

Jaoul

et al. 2016

Vacuum

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HAL is a multi-disciplinary open access archive for the deposit and dissemination of scientific research documents, whether they are published or not. The documents may come from teaching and research institutions in France or abroad, or from public or private research centers. AbstractZirconium thin films were grown on high carbon steel substrates EN C100 (1 %wt. of carbon) by RF magnetron sputtering. In order to study the reactivity of the film/substrate system as a function of the temperature, one hour vacuum annealing was carried out for different temperatures between 600°C and 1100°C. The films were then analyzed by X-ray diffraction, scanning electron microscopy, glow discharge optical emission spectroscopy (GDOES) and nanoindentation.The obtained results showed a progressive transformation of zirconium film to zirconium carbide.Carbon atoms diffusion from substrate toward the film induced this transformation. The sample annealed at 900°C exhibited the best mechanicals properties (H =17 GPa and E = 220 GPa).Samples treated at higher temperature were affected by oxidation and high microporosity. Even if the conversion is uncomplete, annealing significantly promotes adhesion of the film on the substrate.

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Section: Surface Mechanical Propertiessupporting

confidence: 56%

Section: Introductionmentioning

confidence: 99%

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Study of the interaction between a zirconium thin film and an EN C100 steel substrate: Temperature effect

Benouareth

Tristant

Jaoul

et al. 2016

Vacuum

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“…4). Moreover, it is assumed that highly energetic ion flux generated by stable and strong focusing action deliver an excessive energy to the substrate surface causes sputtering and etching and hence results in surface damages such as holes, pores and pits [42,43]. Using the images taken by an Atomic Force Microscope (AFM), we have studied the surface morphology of the films deposited with various focus shots numbers at 0°a ngular position.…”

Section: Resultsmentioning

confidence: 99%

Investigation of Effective Parameters on Metal Nitride Deposition by Plasma Focus Device: Number of Shots and Substrate Axial and Angular Positions

et al. 2015

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Plasma focus (PF) technique is potentially promising candidate for the materials processing and surface modification because of the radiations in a wide range of energies. In this review paper, we discuss and report the use of PF device for transition hard metal nitrides thin film synthesis and investigation of some effective deposition parameters in PF. In this paper, we focus on tungsten nitride film, which has promising industrial and scientific applications. A systematic study has been performed to investigate the effect of the number of focus shots and substrate axial and angular positions on the physical properties of tungsten nitride film deposited by PF device. It is indicated that these parameters are effective in order to obtain good quality tungsten nitride film and estimating the optimum conditions for growing these films with desired physical properties.

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“…The dense plasma focus (DPF) is an unconventional plasma device which is well known as a simple pulsed plasma device; a source for X-rays, neutrons, relativistic electrons and energetic ion beams production [29]. Because of wide ranged multiple phenomenon source, the device has found several applications in a number of fields, such as: thin film deposition [30], ion implantation [31], surface modification [32], thermal surface treatment [33] and number of other applications. In the presently reported research, this deposition technique has been employed for the first time for synthesis of TaN film.…”

Section: Introductionmentioning

confidence: 99%

Growth and Study of Plasma Assisted Nanostructured Hard Tantalum Nitride Thin Films

et al. 2015

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Plasma assisted growth of tantalum nitride films in Mather type dense plasma focus device is reported in the current research. Effects of variation in number of plasma focus shots on structural, compositional and mechanical characteristics of synthesized tantalum nitride thin films have been investigated. Better crystallinity with thermally assisted coagulated growth patterns are observed for films synthesized by maximum (fifteen) plasma focus shots. Nano-hardness of films is observed to increase with increasing plasma focus shots whereas the maximum nanohardness of 16.24 ± 01.54 GPa is observed for film synthesized with fifteen plasma focus shots. Film roughness investigated by atomic force microscopy revealed influence of variation in plasma focus shots on surface roughness which is found to be increased with increase in plasma focus shots.

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Carburizing of zirconium using a low energy Mather type plasma focus

Cited by 33 publications

References 46 publications

Study of the interaction between a zirconium thin film and an EN C100 steel substrate: Temperature effect

Study of the interaction between a zirconium thin film and an EN C100 steel substrate: Temperature effect

Investigation of Effective Parameters on Metal Nitride Deposition by Plasma Focus Device: Number of Shots and Substrate Axial and Angular Positions

Growth and Study of Plasma Assisted Nanostructured Hard Tantalum Nitride Thin Films

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