Carburizing of niobium and tungsten in glow discharge plasma

Preparation of thin copper films from the vapour phase of volatile copper(I) and copper(II) derivatives by the CVD method

“…Attempts were made to use copper(I) halides for the preparation of copper films by the CVD method. 270,271 High evaporator temperatures are required in this case; in addition, the problem of film purity arises owing to the low volatility of the starting compounds. 111 Copper(I) halides are more volatile than copper(II) halides.…”