Carbonization and graphitization of BPDA/PDA polyimide films: effect of structure of polyimide precursor

Takeichi, Tsutomu; Eguchi, Yuji; Kaburagi, Yutaka; Hishiyama, Yoshihiro; Inagaki, Michio

doi:10.1016/s0008-6223(98)00223-1

Cited by 60 publications

(24 citation statements)

References 19 publications

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“…Hence the nanosized graphite-like particles start occurring in positive resists at a lower temperature than in the negative resists. The negative resists too would eventually start showing increasing degree of crystallinity until complete graphitization at 2700°C, as observed by Takechi et al 16 for polyimide derived carbon.…”

Section: Resultsmentioning

confidence: 57%

Pyrolysis of Negative Photoresists to Fabricate Carbon Structures for Microelectromechanical Systems and Electrochemical Applications

Singh

Jayaram

Madou

et al. 2002

J. Electrochem. Soc.

149

120

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Carbon structures were fabricated by the pyrolysis of photopatterned negative photoresists ͑SU-8 and photosensitive polyimide͒ on silicon and fused silica wafers. Results here are compared with those of positive resists published earlier by this group. Negative resist films need exposure to ultraviolet light prior to pyrolysis to produce carbon films. The pyrolysis was carried out in a closed quartz tube furnace in a forming gas ͑95% N 2 , 5% H 2 ͒ atmosphere. The pyrolysis process was characterized using a combination of thermogravimetric analysis and differential thermal analysis. The pyrolysis of SU-8 involved gas evolution in a narower range of temperature than polyimide. The adhesion of the carbon film was found to depend on the resist, the substrate, and the heating cycle used. The carbon structures were characterized in terms of their shrinkage during the pyrolysis, the resistivity, the degree of crystallinity and the peak separation in cyclic voltammetry. Carbons derived from pyrolysis of negative resists showed higher resistivity, vertical shrinkage, and peak-to-peak separation voltage than positive resists. Transmission electron microscope results showed a distinct lack of crystallinity even after pyrolysis at 1100°C, unlike the positive resist derived carbon.

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Section: Resultsmentioning

confidence: 57%

Pyrolysis of Negative Photoresists to Fabricate Carbon Structures for Microelectromechanical Systems and Electrochemical Applications

Singh

Jayaram

Madou

et al. 2002

J. Electrochem. Soc.

149

120

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“…Meanwhile, a temperature rise on the ablated surface, which will take place during the laser irradiation and strongly depends on the laser fluence, can improve the efficiency of the photolysis reaction. On the other hand, unlike the UV laser ablation at higher fluence, the temperature rise cannot reach several thousand degrees centigrade (a start carbonization temperature), 38,39 which is necessary for the pyrolysis of the aromatic system, and the carbonization step cannot take place near the ablation threshold. This is substantiated by the high content of the amide groups (Table I) and no existence of the carbonrich residue on the ablated surface (Figs.…”

Section: Discussionmentioning

confidence: 99%

Near-threshold ultraviolet-laser ablation of Kapton film investigated by x-ray photoelectron spectroscopy

2003

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Near-threshold ultraviolet-laser (355 nm) ablation of 125-μm thick Kapton films was investigated in detail using x-ray photoelectron spectroscopy. Different from the irradiation at higher fluences, the contents of the oxygen, amide group, and C–O group on the ablated surface increased with an increase in the pulse number, whereas the carbon contents decreased, although the contents of the nitrogen and the carbonyl group (C = O) decreased slightly. This implied that there was no carbon-rich residue on the ablated surface. Near the ablation threshold, only photolysis of the C–N bond in the imide rings and the diaryl ether group (C–O) took place due to a low surface temperature rise, and the amide structure and many unstable free radical groups were created. Sequentially, the oxidation reaction occurred to stabilize the free radical groups. The decomposition and oxidation mechanism could explain the intriguing changes of the chemical composition and characteristics of the ablated surface. In addition, the content of the C–O group depended on the opposite factors: the thermally induced decomposition of the ether groups and the pyrolysis of the Caryl–C bond. Upon further irradiation, the cumulative heating may induce the breakage of the Caryl–C bond and enhance the oxidation reaction, resulting in an increase of the content of the C–O group.

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“…They are obtained through the pyrolysis (at high temperature in an inert atmosphere) of polymeric precursors already processed in the form of membranes. In the literature many studies refer on the preparation of carbon membranes from both rubbery and glassy polymers [45][46][47][48][49][50][51], however, currently, Polyimide is the most used precursor [52][53][54][55][56]. Carbon membranes combine improved gas transport properties for light gases (gases of molecular size smaller than 4.0-4.5 Å) with thermal and chemical stability.…”

Section: Membrane Gas Separation Technologies For Co 2 Capture In Posmentioning

confidence: 99%

Membrane technologies for CO2 separation

Brunetti

Scura

Barbieri

et al. 2010

Journal of Membrane Science

843

395

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Carbonization and graphitization of BPDA/PDA polyimide films: effect of structure of polyimide precursor

Cited by 60 publications

References 19 publications

Pyrolysis of Negative Photoresists to Fabricate Carbon Structures for Microelectromechanical Systems and Electrochemical Applications

Pyrolysis of Negative Photoresists to Fabricate Carbon Structures for Microelectromechanical Systems and Electrochemical Applications

Near-threshold ultraviolet-laser ablation of Kapton film investigated by x-ray photoelectron spectroscopy

Membrane technologies for CO2 separation

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