Carbon reaction and diffusion on Ni(111), Ni(100), and Fe(110): Kinetic parameters from x-ray photoelectron spectroscopy and density functional theory analysis

Wiltner, A.; Linsmeier, Ch.; Jacob, Timo

doi:10.1063/1.2971177

Cited by 45 publications

(37 citation statements)

References 32 publications

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“…5) is explained by the more open surface structure of Ni(100). For a detailed explanation of the reaction and diffusion kinetics we refer to [45]. Another aspect of interest is the carbide formation reaction and their thermodynamic properties.…”

Section: Discussionmentioning

confidence: 99%

Thermally induced reaction and diffusion of carbon films on Ni(111) and Ni(100)

Wiltner

Linsmeier

2008

Surface Science

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Thin carbon films on Ni(111) and Ni(100) and the reactive and diffusive interactions between film and substrate are investigated using X-ray photoelectron spectroscopy (XPS). The carbon films are deposited from the vapor phase with the substrates at room temperature. After deposition the films contain mainly elemental carbon. Restricted only to the carbon-nickel interface carbidic carbon is observed. Carbon films of various thicknesses between 0.4 and 3.2 nm are investigated after thermal treatments up to 970 K. The C 1s signal intensities are used for chemical analysis, both in a qualitative and quantitative way. The initially formed carbide partially decomposes between 400 and 570 K. Additional carbide formation sets in again, combined with incipient carbon diffusion, at higher temperatures. Carbon diffusion into the bulk leads to a decreasing C 1s signal intensity until the carbon is almost completely lost into the bulk.

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Section: Discussionmentioning

confidence: 99%

Thermally induced reaction and diffusion of carbon films on Ni(111) and Ni(100)

Wiltner

Linsmeier

2008

Surface Science

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“…These metals are of particular scientific interest, since the carbide formation reaction for Fe and Ni is endothermic under standard conditions [26][27][28].…”

Section: Surface Reaction Experimentsmentioning

confidence: 99%

Surface chemistry of first wall materials – From fundamental data to modeling

Linsmeier¹,

Reinelt²,

Schmid³

2011

Journal of Nuclear Materials

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The application of different materials at the first wall of fusion devices, like beryllium, carbon, and tungsten in the case of ITER, unavoidably leads to the formation of compounds. These compounds are created dynamically during operation and depend on the local parameters like surface temperature, incoming particle energies and species. In dedicated, well-defined laboratory experiments, using mainly X-ray photoelectron spectroscopy and Rutherford backscattering analysis for qualitative and quantitative chemical surface analysis, the parameter space in relevant element combinations are investigated. These studies lead to a deep understanding of the reaction mechanisms under the applied conditions and to a quantitative description of reaction and diffusion processes. These data can be parameterized and integrated into a modeling approach which combines dynamic surface chemistry with the modeling of the transport in the plasma. Two different approaches for surface reaction modeling are compared and benchmarked with experimental data.

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“…The binding energy (BE) axis is referenced to the Au 4 7/2 peak at 84.0 eV and the spectra are measured at 45 ∘ exit angle. Further experimental details can be found elsewhere [12]. Since XPS is very surface sensitive the N implantation is performed in situ to avoid contamination of the surface with adsorbates during transport through air.…”

Section: Xps Measurementsmentioning

confidence: 99%

Interaction of nitrogen plasmas with tungsten

Schmid¹,

Manhard

Linsmeier

et al. 2010

Nucl. Fusion

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Abstract.The use of nitrogen seeding to reduce the edge plasma temperature has recently been successfully applied in ASDEX Upgrade. While the plasma performance was significantly improved compared to other seeding species like Ar or Ne, questions remained as to the interaction of nitrogen with a tungsten first wall. In particular the formation of thick tungsten nitride layers with reduced melting temperature and increased physical sputtering was a concern. Therefore dedicated laboratory experiments have been performed to investigate the interaction of W surfaces with N plasmas. Tungsten coated Si samples were exposed to N ions from plasma and ion gun sources at energies from 20 eV to 10 keV and W surface temperatures from 300 to 750 K. After exposure to the N plasma with fluences of up to several 10 23 N m 2 the N content in the samples was measured by nuclear reaction analysis. The sputter erosion was determined by measuring the thickness change of the W layer by RBS. The formation of W nitride phases was investigated in separate XPS experiments where the samples were implanted in situ with keV N ions. It was found that only very small fractions of N are accumulated in the W surface and that N is bound in a nitride state. At temperatures above 600 K the nitrides are no longer stable which further reduces the N uptake into the W. Moreover the accumulation of N in the surface leads to a decrease in W physical sputtering due to the lower W concentration at the surface.

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Carbon reaction and diffusion on Ni(111), Ni(100), and Fe(110): Kinetic parameters from x-ray photoelectron spectroscopy and density functional theory analysis

Cited by 45 publications

References 32 publications

Thermally induced reaction and diffusion of carbon films on Ni(111) and Ni(100)

Thermally induced reaction and diffusion of carbon films on Ni(111) and Ni(100)

Surface chemistry of first wall materials – From fundamental data to modeling

Interaction of nitrogen plasmas with tungsten

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