Carbon nitride films grown by cathodic vacuum arc for hemocompatibility applications

Galeano-Osorio, D.S.; Vargas, Santiago; Ospina, Rogelio; Arango, P.J.

doi:10.15446/dyna.v81n186.39121

Cited by 5 publications

(3 citation statements)

References 39 publications

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“…[21] The sample 4 presented a higher value of I N /I G ratio (Table 3), confirming the RBS and EDS analyses. Although the sample 2 (20% N 2 flow rate) presents nitrogen in its composition, the N¼N peak was not observed, probably because the nitrogen is bonded with carbon, which can be explained by the higher I D /I G ratio compared with the other samples.…”

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confidence: 74%

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Impact of high N₂flow ratio on the chemical and morphological characteristics of sputtered N-DLC films

Leal

Fraga

Rasia³

et al. 2016

Surf. Interface Anal.

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a Because of their outstanding characteristics, diamond-like carbon (DLC) thin films have been recognized as interesting materials for a variety of applications. For this reason, the effects of the incorporation of different elements on their fundamental properties have been the focus of many studies. In this work, nitrogen-incorporated DLC films were deposited on Si (100) substrates by DC magnetron sputtering of a graphite target under a variable N 2 gas flow rate in CH 4 + N 2 + Ar gas mixtures. The influence of high N 2 flow ratios (20, 40 and 60%) on the chemical, structural and morphological properties of N-DLC films was investigated. Different techniques including field emission gun-equipped scanning electron microscope (FEG-SEM), energy-dispersive X-ray spectroscopy (EDS), atomic force microscopy (AFM), profilometry, Rutherford backscattering spectrometry (RBS) and Raman spectroscopy (325-nm and 514-nm excitation) were used to examine the properties of the N-DLC films. Thus, the incorporation of nitrogen was correlated with the morphology, roughness, thickness, structure and chemical bonding of the films. Overall, the results obtained indicate that the fundamental properties of N-DLC films are not only related to the nitrogen content in the film but also to the type of chemical bonds formed.

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“…The samples 3 and 4, with the higher nitrogen content, show another peak at 1474–1482 cm −1 called N. According to Galeano‐Osorio et al , this peak is related to NN stretching vibrations between 1400 and 1500 cm −1 . The sample 4 presented a higher value of I N /I G ratio (Table ), confirming the RBS and EDS analyses.…”

Section: Resultsmentioning

confidence: 96%

Impact of high N₂flow ratio on the chemical and morphological characteristics of sputtered N-DLC films

Leal

Fraga

Rasia³

et al. 2016

Surf. Interface Anal.

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“…Industrial and technological development has increased the materials technology demand, focused on increasing the performance of industrial pieces by improving the behavior of its surface. The cathodic arc deposition is a process successfully used for this purpose, due to its wide area of applications in hard and decorative coatings [1,2]. The discharge process uses a power supply to generate an electric arc between two electrodes of high current and low voltage, which is directed toward a cathodic target.…”

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confidence: 99%

Numerical analysis of the cathodic material influence on the arc plasma jet

Narvaez

Álvarez²,

Ramírez

et al. 2019

Rev. Mex. Fís.

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The cathodic arc discharge is a deposition technique widely used to synthesize hard coatings and thin films. The structure of the plasma generated by the electrical discharge and its interaction with neutral particles was studied using numerical simulations. Typical plasma parameters were characterized considering their spatial and temporal dependence, as well as several cathode materials that are commonly used in these systems. For the evolution of the ion density, it was observed the formation of Knudsen layer, and also a dependence of pressure gradients in the global behavior. With respect to the kinetic energy, it was found a deceleration of ions, which is represented by a shock front produced in the plasma−neutrals interaction. On the other hand, the energy releasing was generated due to the heat transference between electrons and ions. The plasma potential follows a behavior, which is similar to that of the ion density, and it is caused by the dynamics of charged particles which is directly affected by the concentration of neutrals and ions. In general, the physical quantities are directly affected by electrical and thermal conductivity of the cathode material. Our results can be applied to understand the plasma phenomena produced in a cathodic arc discharge

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Comparison of a-C:N:H layers grown at the anode and cathode in RF-PACVD processing

Tkacz–Śmiech

Dyndał

Sanetra

et al. 2017

Vacuum

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Carbon nitride films grown by cathodic vacuum arc for hemocompatibility applications

Cited by 5 publications

References 39 publications

Impact of high N₂flow ratio on the chemical and morphological characteristics of sputtered N-DLC films

Impact of high N₂flow ratio on the chemical and morphological characteristics of sputtered N-DLC films

Numerical analysis of the cathodic material influence on the arc plasma jet

Comparison of a-C:N:H layers grown at the anode and cathode in RF-PACVD processing

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Carbon nitride films grown by cathodic vacuum arc for hemocompatibility applications

Cited by 5 publications

References 39 publications

Impact of high N2flow ratio on the chemical and morphological characteristics of sputtered N-DLC films

Impact of high N2flow ratio on the chemical and morphological characteristics of sputtered N-DLC films

Numerical analysis of the cathodic material influence on the arc plasma jet

Comparison of a-C:N:H layers grown at the anode and cathode in RF-PACVD processing

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Impact of high N₂flow ratio on the chemical and morphological characteristics of sputtered N-DLC films

Impact of high N₂flow ratio on the chemical and morphological characteristics of sputtered N-DLC films