2011
DOI: 10.1016/j.carbon.2011.07.002
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Carbon nanowalls deposited by inductively coupled plasma enhanced chemical vapor deposition using aluminum acetylacetonate as precursor

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Cited by 24 publications
(22 citation statements)
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“…We exemplified the first report of Naab et al [22] of hydrogen content on commercially available single-, double-, and multiwalled nanotubes and carbon nanofibers and the report of Gohier et al [23] which found values between 4 and 8 at.% of hydrogen in multiwall carbon nanotubes by using high energy of 35 MeV Cl 7+ ion beam. The hydrogen content in CNW was reported before by Jain et al [24] in percentage of 3%-5% by SIMS and Nuclear Table 1 show values ranging from 4.5 to 10%, values obtained by integrating upon depth (areal density) the spectra shown in Figure 3. They reveal that hydrogen is found in the highest amount in CNPs at 673 K with 9.7 at.%.…”
Section: Erda Measurementssupporting
confidence: 60%
“…We exemplified the first report of Naab et al [22] of hydrogen content on commercially available single-, double-, and multiwalled nanotubes and carbon nanofibers and the report of Gohier et al [23] which found values between 4 and 8 at.% of hydrogen in multiwall carbon nanotubes by using high energy of 35 MeV Cl 7+ ion beam. The hydrogen content in CNW was reported before by Jain et al [24] in percentage of 3%-5% by SIMS and Nuclear Table 1 show values ranging from 4.5 to 10%, values obtained by integrating upon depth (areal density) the spectra shown in Figure 3. They reveal that hydrogen is found in the highest amount in CNPs at 673 K with 9.7 at.%.…”
Section: Erda Measurementssupporting
confidence: 60%
“…9,24,25 However, as the growth progresses, the atomic hydrogen ( H * ) generated from the dissociation of CH4 by microwave energy also start etching the growing film. The concurrent growth and etching processes make the VGNs to gain height and decrease the number density.…”
Section: Sem Analysismentioning
confidence: 99%
“…Since then, several groups have explored the growth of VGNs on catalytic as well as non-catalytic metal / dielectric surfaces using various plasma based techniques such as microwave PECVD, dc plasma discharge, ICP-plasma and thermal plasma jet systems. [10][11][12][13][14][15][16][17][18][19][20][21][22][23][24][25][26][27] In an excellent review, Bo et al 11 summarized the influence of various key process parameters on the synthesis and growth model for NGSs on various types of substrates. In spite of several existing reports, herein we note that, still there is no unique theory that could unveil the atomistic growth mechanism and give a prescription to optimize the process parameters for a given plasma source.…”
Section: Introductionmentioning
confidence: 99%
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“…Such intriguing free standing vertically oriented wall structures offer greater active surface area for materials functionalization, which can provide effective electron pathways and thus can be good candidates as ideal photoelectrode for PEC application. Journal of Nanomaterials One may see that the individual layers of the 2D-CNW structures are interconnected to each other to form the wavylike 2D-CNW with thickness ∼10 nm while the measured lattice fringes are about 0.36 nm, which correspond to typical lattice spacing of graphitic materials [10]. Raman spectroscopy was used to characterize the structural properties of the 2D-CNW films prepared at different P rf .…”
Section: Formation Of Hierarchical 2d-cnwmentioning
confidence: 99%