2004
DOI: 10.1016/j.mseb.2004.05.038
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Carbon nanotubes growth by chemical vapor deposition using thin film nickel catalyst

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Cited by 57 publications
(38 citation statements)
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“…Ni nanocrystallites in films used as a substrate in CVD process play the role of a catalytic agent in the carbon nanotube creation. Effect of Nickel precursor on the growth of carbon nanotubes obtained by CVD method has been confirmed in numerous works [30][31][32][33][34]. The theoretical discussions in many papers [14,[35][36][37] confirm that the nanotube growth starts from fullerene particle.…”
Section: Discussionmentioning
confidence: 80%
“…Ni nanocrystallites in films used as a substrate in CVD process play the role of a catalytic agent in the carbon nanotube creation. Effect of Nickel precursor on the growth of carbon nanotubes obtained by CVD method has been confirmed in numerous works [30][31][32][33][34]. The theoretical discussions in many papers [14,[35][36][37] confirm that the nanotube growth starts from fullerene particle.…”
Section: Discussionmentioning
confidence: 80%
“…There are three main steps in the synthesis process. 76 The first step is the cracking step, where the energy source is used to crack the gas phase molecule into atomic carbon. The second step is the diffusion step, during which cracked atomic carbon diffuses toward the substrate.…”
Section: Cvdmentioning
confidence: 99%
“…The increase in demand for these nanostructures is mainly attributed to their unique electrical, optical, magnetic, thermal, mechanical and chemical properties [5,9]. Several fabrication methods including electrochemical deposition [10], electroless deposition [11], sol-gel [12], chemical vapour deposition (CVD) [13,14], and atomic layer deposition (ALD) [15] have been utilized to deposit 1D carbon [13,14], metal [15], oxide [12], semiconducting [12], polymer [10], and hybrid [11] nanostructures. However, the CVD and ALD processes require high deposition temperatures, typically ranging between 500 °C and 900 °C.…”
Section: Introductionmentioning
confidence: 99%