2016
DOI: 10.1039/c6ra04599e
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Carbon fibre production during hydrogen plasma etching of diamond films

Abstract: Different morphology of carbon fibres have been synthesised on diamond films by hydrogen plasma etching in the presence of silicon.

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Cited by 5 publications
(2 citation statements)
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“…Therefore, in the thin part of the diamond film, the silicon atoms in the silicon substrate reach the surface of the diamond film through diffusion, catalyzing the conversion of the diamond film into carbon nanowires. 36 After etching for 30 min, the diamond surface is more severely etched, mainly showing many irregular pores etched at the grain boundary. The etched pores on the grain are connected together, but more nickel nanoparticles are exposed compared to those etched for 20 min.…”
Section: Resultsmentioning
confidence: 99%
“…Therefore, in the thin part of the diamond film, the silicon atoms in the silicon substrate reach the surface of the diamond film through diffusion, catalyzing the conversion of the diamond film into carbon nanowires. 36 After etching for 30 min, the diamond surface is more severely etched, mainly showing many irregular pores etched at the grain boundary. The etched pores on the grain are connected together, but more nickel nanoparticles are exposed compared to those etched for 20 min.…”
Section: Resultsmentioning
confidence: 99%
“…In this work, the RGO were in situ created into the CF network by electrochemical deposition technology. similar explorative studied have also been attempted in the fabrication of graphene-heterostructure filler with combined electrical loss/magnetic loss [18][19][20][21][22]. [23].…”
Section: Introductionmentioning
confidence: 99%