“…Anodization of an Ir film (Cogan, 2008) and thermal oxidation of metallic iridium (Bayer & Wiedemann, 1975;Chalamala et al, 1999Chalamala et al, , 2000 have been in use for a long period of time. Furthermore, IrO 2 thin films are also deposited hydrothermally (da Silva et al, 2017) using the Adams fusion method (Rasten et al, 2003;Abbott et al, 2016), spray pyrolysis (Patil et al, 2003), electro-deposition (Yagi et al, 2005), sol-gel methods (Bernicke et al, 2015), pulsed-laser deposition (Gong et al, 2009;Hou et al, 2017), laser ablation (Wang et al, 2006;Gong et al, 2013), chemical vapour deposition (CVD) (Liao et al, 2001;Jü rgensen et al, 2017) and atomic layer deposition (ALD) (Hä mä lä inen et al, 2008(Hä mä lä inen et al, , 2014. Among the various thin-film deposition methods, ALD offers unsurpassed conformality and thickness uniformity properties, making it the method of choice for coating highly complex shapes (Ritala & Niinistö, 2009;George, 2010;Leskelä et al, 2014).…”