Z. Anal. Chem.
 1987
DOI: 10.1007/bf00469133
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Calibration of sputtering yields for AES depth profiling of oxide layers on aluminium by means of carrier-gas heat extraction analysis

T. F. Chen1,
R. P. H. Garten2,
E. Grallath3
et al.
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Cited by 8 publications
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