2004
DOI: 10.1016/j.tsf.2004.04.040
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Calculation of the optical constants of a thin layer upon a transparent substrate from the reflection spectrum using a genetic algorithm

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Cited by 34 publications
(12 citation statements)
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“…The angle difference D/ is p between two nearest oscillating peaks in the weak absorption region according to Eqs. (3) and (8).…”
Section: Extracting the Sample Thickness From Fringing Reflectancementioning
confidence: 99%
See 1 more Smart Citation
“…The angle difference D/ is p between two nearest oscillating peaks in the weak absorption region according to Eqs. (3) and (8).…”
Section: Extracting the Sample Thickness From Fringing Reflectancementioning
confidence: 99%
“…[1][2][3] For a slab of weak optical absorption, one usually considers only the real part of the index (called the refractive index) and neglects the imaginary part (called the extinction coefficient) for simplicity in analysis. 2,[4][5][6][7][8][9] However, the latter becomes important when a more accurate analysis is required. 2 It can reveal spectral features behind which there are interesting physical processes.…”
Section: Introductionmentioning
confidence: 99%
“…Such tangential points though occur only in the spectral region of negligible to medium absorption in the film [6], which limits the spectral region of applicability of the algorithm. Nevertheless, this algorithm is often-used for drawing envelopes of transmittance spectra, in optical characterization by the method of Swanepoel [10][11]. Furthermore, in [9] are shown computed data for n(λ = 300÷700 nm) of a film (Y 2 O 3 ) 0.9 :(SiO 2 ) 0.1 of the rare earth element Ittrium.…”
Section: Introductionmentioning
confidence: 99%
“…The spectrophotometric method was wildly used to determine the optical constants of thin films from the reflectance and transmittance measurements based on the minimization process of the difference between the calculated and the measured values [9][10][11][12][13][14][15][16][17][18][19][20][21][22][23], or based on the interference fringe patterns process [24][25][26][27][28][29][30]. And various combinations of measured quantities at various conditions (the transmittance, the reflectance from the front or back side, the normal or oblique or multiple angles incidence, the perpendicular or parallel polarized radiation) can be used.…”
Section: Introductionmentioning
confidence: 99%