2019
DOI: 10.21272/jnep.11(2).02023
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Calculation of Electron Mobility for the Strained Germanium Nanofilm

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Cited by 3 publications
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“…That is, such nanofilms will be dielectrics in terms of their electrical conductivity, especially when their thickness is d < 7 nm. The increase in the intrinsic carrier concentration for the strained Ge nanofilms with the thickness d > 7 nm vs unstrained ones is explained, first of all, by the decrease of the band gap due to internal mechanical strains [19]. The maximum relative increase of the concentration of intrinsic current carriers is observed for the Ge/Si nanofilm because in this case the magnitude of internal mechanical strains is the largest, and the band gap of such nanofilm will be the smallest compared to Ge/Ge(0.9)Si(0.1) and Ge/Ge(0.64)Si(0.36) nanofilms.…”
Section: Resultsmentioning
confidence: 95%
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“…That is, such nanofilms will be dielectrics in terms of their electrical conductivity, especially when their thickness is d < 7 nm. The increase in the intrinsic carrier concentration for the strained Ge nanofilms with the thickness d > 7 nm vs unstrained ones is explained, first of all, by the decrease of the band gap due to internal mechanical strains [19]. The maximum relative increase of the concentration of intrinsic current carriers is observed for the Ge/Si nanofilm because in this case the magnitude of internal mechanical strains is the largest, and the band gap of such nanofilm will be the smallest compared to Ge/Ge(0.9)Si(0.1) and Ge/Ge(0.64)Si(0.36) nanofilms.…”
Section: Resultsmentioning
confidence: 95%
“…4, 5. The electron mobility decreases with increasing silicon content in the substrate, and hence the magnitude of internal mechanical strains in such nanofilms [19], and is virtually independent of the thickness as well as temperature.…”
Section: Resultsmentioning
confidence: 99%
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