2020
DOI: 10.1016/j.scib.2019.11.001
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C-V characteristics of piezotronic metal-insulator-semiconductor transistor

Abstract: Electrical characteristics of AlGaN/GaN metal-insulator-semiconductor high electron mobility transistor using La 2 O 3 gate dielectric SCIENCE CHINA Technological Sciences 56, 629 (2013); InGaN metal-insulator-semiconductor photodetector using Al 2 O 3 as the insulator SCIENCE CHINA Technological Sciences 56, 633 (2013); I-V and C-V properties of TiO 2 thin film by pulsed-laser reactive deposition Chinese Science Bulletin 43, 1344 (1998);Analysis of temperature-dependent characteristics of a 4H-SiC metal-semic… Show more

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Cited by 9 publications
(4 citation statements)
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References 49 publications
(58 reference statements)
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“…While P OOP is down, the GF of the PM-FEST device reaches a maximum of 6.8 × 10 3 under compression, and 1.1 × 10 4 under tension. Compared with devices based on piezoelectric semiconductor materials, [5,7,18,[35][36][37][38][39][40][41][42][43][44][45][46][47] our device presents with an outstanding high GF (Figure 3e, Tables S1 and S2, Supporting Information) and these results indicate the advantages of ferroelectric semiconductor 𝛼-In 2 Se 3 with a large piezoelectric coefficient for piezotronic devices.…”
Section: Resultsmentioning
confidence: 93%
“…While P OOP is down, the GF of the PM-FEST device reaches a maximum of 6.8 × 10 3 under compression, and 1.1 × 10 4 under tension. Compared with devices based on piezoelectric semiconductor materials, [5,7,18,[35][36][37][38][39][40][41][42][43][44][45][46][47] our device presents with an outstanding high GF (Figure 3e, Tables S1 and S2, Supporting Information) and these results indicate the advantages of ferroelectric semiconductor 𝛼-In 2 Se 3 with a large piezoelectric coefficient for piezotronic devices.…”
Section: Resultsmentioning
confidence: 93%
“…In contrast, the changes in capacitance, as shown in Figure c,d, exhibit a steady and consistent trend along with small variations in response to applied pressure in both the high-performance and low-power regimes. The impact of the piezocharges on the capacitance of the Schottky diode can be illustrated by eq C ( e 33 ) = A ε normalS W normald normale normalp normale normalf normalf normale normalc normalt normali normalv normale ( e 33 ) where C (e 33 ) is the capacitance, A is the sample area, and W dep‑effective (e 33 ) is the effective depletion width, related to the piezocharges by eq , W dep effective ( e 33 ) = true[ 2 ε s ( V bi q 2 ρ piezo W piezo 2 2 ε s + V bias ) q N d true] 1 / 2 where V bi is the built-in potential, V bias is the external bias voltage, and N d is the donor concentration. Hence, the changes of effective depletion width induced by piezocharges can be readily extracted from the pressure-dependent C – V curves based on eq normalΔ W dep effec …”
Section: Resultsmentioning
confidence: 99%
“…Jin et al advanced their work to the small-signal dynamic characterization of the piezotronic effect by studying the diffusion capacitance and conductivity of piezoelectric p-n junctions under external compressive stress at low and high frequencies [ 65 ]. Furthermore, the researchers also simulated the piezotronic effects in more complex devices, such as FET [ 66 ], MIS devices [ 67 ], and BJT [ 68 ].…”
Section: Piezotronics Based On Zno Nanowiresmentioning
confidence: 99%