Buffered Oxide Etch: A Safer, More Effective Etchant for Additively Manufactured Ti-Alloys
Jayshri Dumbre,
Zherui Tong,
Dashen Dong
et al.
Abstract:Kroll’s reagent is effective for the metallographic etching of traditional Ti-alloys but struggles with the intricate, refined microstructures of newer Ti-alloy compositions like Ti-Cu and Ti-Mo alloys, which are created through additive manufacturing. The presence of fine intermetallic compounds in these alloys results in limited contrast between grains and phases when using Kroll’s reagent, highlighting the need for an alternative etchant. This study systematically investigates the use of buffered oxide etch… Show more
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