2015
DOI: 10.1016/j.vacuum.2014.09.013
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Broadening of the transmission range of dielectric/metal multilayer structures by using different metals

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Cited by 29 publications
(16 citation statements)
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“…[ 1,2 ] Furthermore, adequate mechanical flexibility is shown by DMD structured electrodes owing to the good ductility of metals, which also enables the application of DMD electrodes in flexible optoelectronic devices. [ 69 ] Several TCEs based on DMD structure—ZnS/Cu:Ag/WO 3 , [ 70 ] AZO/Ag/AZO, [ 71 ] MoO 3 /Ag/MoO 3 , [ 72 ] ZnS/Cu/Ag/ZnS, [ 73 ] and AZO/AgNW/AZO/ZnO [ 74 ] electrodes were evaluated in this study.…”
Section: Resultsmentioning
confidence: 99%
“…[ 1,2 ] Furthermore, adequate mechanical flexibility is shown by DMD structured electrodes owing to the good ductility of metals, which also enables the application of DMD electrodes in flexible optoelectronic devices. [ 69 ] Several TCEs based on DMD structure—ZnS/Cu:Ag/WO 3 , [ 70 ] AZO/Ag/AZO, [ 71 ] MoO 3 /Ag/MoO 3 , [ 72 ] ZnS/Cu/Ag/ZnS, [ 73 ] and AZO/AgNW/AZO/ZnO [ 74 ] electrodes were evaluated in this study.…”
Section: Resultsmentioning
confidence: 99%
“…通过使用比相应金属具有更大介电常 数的介质层, 可以抑制介质/金属界面的SP耦合的发 生, 因此, 使用更大介电常数的介质材料通常可增加 多层膜的光透过率 [63] . [28,48] , TiO 2 [24] , ZnS [38] , WO 3 [25] 和MoO 3 [32] 等 , TCO 材 料 有 ITO [18,35,60] , AZO [28,33,34,51] , IZO [18] , IGZO [19] , MTO [20] , FTO [21] , 掺镓氧化锌(GZO) [50] 等, 这些TCO一般都是n型的; 但一些p型材料也可以使 用 , 比 如 CuAlO 2 [22] . 此 外 , 有 机 透 明 导 电 材 料…”
Section: Tcf的表面电阻(r S )和光透过率(T)是衡量其光unclassified
“…The inserting Cu thin film with Mo film may change the optic parameter(n,k) of AZO/Mo/AZO layer leading to improved transmittance in visible spectrum range. Cu/Ag structure [23] has been proved effective to broaden the transmission range of multi-layer films with mixed index of Cu-Ag. Thus, the optimized Cu layer thickness would be critical to optoelectronic property of multilayer layer.…”
Section: Azo/cu/mo/azo Multi-layer Filmsmentioning
confidence: 99%
“…Lin et al [23] has reported AZO/Mo/AZO structure film with a low FOM (2.53 Â 10 À5 ) which could be improved by the treatment of H 2 plasma to achieve a higher FOM (1.01 Â 10 À4 ). Further efforts have been done by optimizing the Mo and AZO layer thickness and a FOM of 2.23 Â 10 À4 has been obtained [12].…”
Section: Azo/cu/mo/azo Multi-layer Filmsmentioning
confidence: 99%