2009
DOI: 10.1063/1.3171930
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Broadband moth-eye antireflection coatings fabricated by low-cost nanoimprinting

Abstract: Subwavelength scale antireflection moth-eye structures in silicon were fabricated by a wafer-scale nanoimprint technique and demonstrated an average reflection of 1% in the spectral range from 400 to 1000 nm at normal incidence. An excellent antireflection property out to large incident angles is shown with the average reflection below 8% at 60°. Pyramid array gave an almost constant average reflection of about 10% for an incident angle up to 45° and concave-wall column array produced an approximately linear r… Show more

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Cited by 216 publications
(135 citation statements)
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“…12,13 Other technologically important template technique is nanoimprint lithography, which has been shown to be a simple and low cost method with high resolution and throughput in fabricating nano-scale antireflection coatings. 14 We chose HSQ as a resist material because it can be used in room temperature nanoimprinting without any further treatment, producing features with very high resolution linewidth.…”
Section: -3mentioning
confidence: 99%
“…12,13 Other technologically important template technique is nanoimprint lithography, which has been shown to be a simple and low cost method with high resolution and throughput in fabricating nano-scale antireflection coatings. 14 We chose HSQ as a resist material because it can be used in room temperature nanoimprinting without any further treatment, producing features with very high resolution linewidth.…”
Section: -3mentioning
confidence: 99%
“…A good antireflective coating should show low reflectance over a wide AOI for both forms of light polarization [8,23], which is important for applications in sunrise-to-sunset solar cells [24]. The angledependent reflectivities for a polished Si wafer, planar SiNC array and corrugated SiNC arrays are shown in Fig.…”
Section: Resultsmentioning
confidence: 99%
“…Unique physical properties appear within such small dimensions owing to quantum confinement or high surface energy, which make nanostructured silicon more feasible for photovoltaic devices. One-dimensional nanostructures such as nanotips (NTs), nanorods, and nanowires (NWs) could present great anti-reflection properties [63][64][65][66]. The reflection of such structures can be significantly reduced down to 5% [64,65] or even 1% [63] for a broadband spectrum from UV to near-IR which matches the solar spectrum.…”
Section: A Radial P-n Junction Structurementioning
confidence: 99%