A series of novel humidity-responsive
and photosensitive polymer
films (PCA–PAA–PEG) are prepared. These films can be
patterning cross-linked by the photodimerization of coumarin pendant
groups. The humidity-induced deformation can be well controlled by
the pattern because of the different modulus and hydrophilicity between
cross-linked and un-cross-linked segments. In addition, the pattern
can be erased and the deformation direction can be changed programmatically
by the de-cross-linking–re-cross-linking approach due to the
reversible photodimerization of coumarin groups. The cross-linking
degree also affects the humidity responsiveness of the film. The deformation
of the gradient patterning cross-linked film can be more accurately
controlled. Moreover, the length and width ratio (L/W
s/W
h) of
the un-cross-linked segment to the cross-linked segment affects the
deformation of the films as well. When L/W
s/W
h is 5/2/1 or
5/3/1, the deformation is controllable, and when L/W
s/W
h is
5/1/1 or 5/4/1, the deformation is random at the initial stage, but
the whole film will bend along the short axis in the end.