Breaking the symmetry of nanosphere lithography with anisotropic plasma etching induced by temperature gradients

Darvill, Daniel; Iarossi, Marzia; Ekeroth, R. M. Abraham; Hubarevich, Aliaksandr; Huang, Jian‐An; Angelis, Francesco De

doi:10.1039/d0na00718h

Cited by 15 publications

(14 citation statements)

References 94 publications

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“…Size control of shrunk particles in a tightly packed periodic PS array is important to create mesh structures and extend the application of NSL. To this end, RIE, [ 97,98 ] ion beam etching (IBE), [ 99 ] plasma etching (PE), [ 21,85,97,100,101 ] and inductively coupled plasma etching (ICPE) [ 102,103 ] can be used. Different gases including O 2 , [ 85,104,105 ] Ar, [ 85 ] O 2 /Ar, [ 21 ] or CF 4 /O 2 [ 106 ] are applicable for the plasma etching processes, resulting in varied etching speeds and particle surface roughness.…”

Section: Nanosphere Lithography Technique For Transparent Conductive ...mentioning

confidence: 99%

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Nanosphere Lithography: A Versatile Approach to Develop Transparent Conductive Films for Optoelectronic Applications

et al. 2022

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Transparent conductive films (TCFs) are irreplaceable components in most optoelectronic applications such as solar cells, organic light‐emitting diodes, sensors, smart windows, and bioelectronics. The shortcomings of existing traditional transparent conductors demand the development of new material systems that are both transparent and electrically conductive, with variable functionality to meet the requirements of new generation optoelectronic devices. In this respect, TCFs with periodic or irregular nanomesh structures have recently emerged as promising candidates, which possess superior mechanical properties in comparison with conventional metal oxide TCFs. Among the methods for nanomesh TCFs fabrication, nanosphere lithography (NSL) has proven to be a versatile platform, with which a wide range of morphologically distinct nanomesh TCFs have been demonstrated. These materials are not only functionally diverse, but also have advantages in terms of device compatibility. This review provides a comprehensive description of the NSL process and its most relevant derivatives to fabricate nanomesh TCFs. The structure‐property relationships of these materials are elaborated and an overview of their application in different technologies across disciplines related to optoelectronics is given. It is concluded with a perspective on current shortcomings and future directions to further advance the field.

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Section: Nanosphere Lithography Technique For Transparent Conductive ...mentioning

confidence: 99%

“…Mask Modification: Size control of shrunk particles in a tightly packed periodic PS array is important to create mesh structures and extend the application of NSL. To this end, RIE, [97,98] ion beam etching (IBE), [99] plasma etching (PE), [21,85,97,100,101] and inductively coupled plasma etching (ICPE) [102,103] can be used.…”

Section: (5 Of 26)mentioning

confidence: 99%

Nanosphere Lithography: A Versatile Approach to Develop Transparent Conductive Films for Optoelectronic Applications

et al. 2022

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“…To overcome this challenge, a lot of research efforts have been made for nanocrystal structures breaking HCP symmetry. A symmetrical breaking along the thickness by non-uniform etching was observed by Darvil et al [8]. Myint et al [9] observed crystal structures from a three-fold azimuthal symmetry deposition.…”

Section: Introductionmentioning

confidence: 82%

“…It is conventionally used to create triangular crystals with a hexagonal close-packed (HCP) order [3,6,7]. There have been few efforts in the past to expand the scope of nanostructure fabrication using this technique [8,9]. For this reason, NSL does not have versatile applicability, despite its immense advantages over other techniques.…”

Section: Introductionmentioning

confidence: 99%

Combining Azimuthal and Polar Angle Resolved Shadow Mask Deposition and Nanosphere Lithography to Uncover Unique Nano-Crystals

Ganguly

Das

2022

Nanomaterials

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In this article, we present a systematic investigation on a multistep nanosphere lithography technique to uncover its potential in fabricating a wide range of two- and three-dimensional nanostructures. A tilted (polar angle) electron beam shower on a nanosphere mask results in an angled shadow mask deposition. The shape of the shadow also depends on the azimuthal angle of the mask sitting on top of the substrate. We performed angled shadow mask depositions with systematic variation of these two angular parameters, giving rise to complex nanostructures (down to 50 nm), repeated over a large area without defect. In this article, nanosphere lithography with two- and four-fold azimuthal symmetry was studied at constant tilt angles followed by variations in tilt without azimuthal rotation of the substrate. Finally, both angular parameters were simultaneously varied. The structure of shadow crystals was explained using Matlab simulation. This work stretches the horizons of nanosphere lithography, opening up new scopes in plasmonic and magnonic research.

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“…The density of beads could be controlled by the deposition time and beads concentration. The beads size could be reduced by O 2 plasma etching [ 39 ] in the inductively coupled plasma‐reactive ion etching system (ICP‐RIE, SENTECH SI500). ICP–RIE etching was conducted with an O 2 gas flow of 50 sccm, a radio frequency (RF) power of 80 W, an ICP power of 60 W, a temperature of 5 °C, and a pressure of 1 Pa. Then, the samples were loaded into an electron beam deposition chamber (Ebeam, PVD75 Kurt J. Lesker company) in order to deposit a layer of Al 2 O 3 (90 nm) to serve as an etching mask and protect the photoresist underneath.…”

Section: Methodsmentioning

confidence: 99%

Hyperbolic Nanoparticles on Substrate with Separate Optical Scattering and Absorption Resonances: A Dual Function Platform for SERS and Thermoplasmonics

Zhao

Hubarevich

Iarossi

et al. 2021

Advanced Optical Materials

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Tuning optical properties of plasmonic nanostructures, including their absorption, scattering, and local‐field distribution is of great interest for various applications that rely on optical energy regulated by plasmonic effects. Conventional plasmonic nanostructures enhance light scattering and absorption simultaneously, leading to compromise for either surface‐enhanced spectroscopy or thermoplasmonic applications. In this paper, a dual functional platform based on a hyperbolic meta particles (HMP) substrate that exhibits separate and tuneable wavelengths of absorption and scattering resonances for both thermoplasmonics and surface enhanced Raman spectroscopy (SERS), is demonstrated. Significantly, either light‐to‐heat conversion efficiency at the absorption resonance band or SERS performance at the scattering resonance band of the HMP substrate is improved in comparison to those of plasmonic gold nanoparticles. Taking advantage of the flexible control of the separate scattering and absorption channels, the influence of the absorption resonance band position on the SERS signal is also investigated. The platform shows unique potential for in vitro biosensing in thermal modulation and in situ monitoring.

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Breaking the symmetry of nanosphere lithography with anisotropic plasma etching induced by temperature gradients

Abstract: A strongly anisotropic etching process mediated by temperature is presented to create nano mushroom arrays from a monolayer of spheres.

Cited by 15 publications

References 94 publications

Nanosphere Lithography: A Versatile Approach to Develop Transparent Conductive Films for Optoelectronic Applications

Nanosphere Lithography: A Versatile Approach to Develop Transparent Conductive Films for Optoelectronic Applications

Combining Azimuthal and Polar Angle Resolved Shadow Mask Deposition and Nanosphere Lithography to Uncover Unique Nano-Crystals

Hyperbolic Nanoparticles on Substrate with Separate Optical Scattering and Absorption Resonances: A Dual Function Platform for SERS and Thermoplasmonics

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