2024
DOI: 10.1039/d4lp00109e
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Branched benzocyclobutene polysiloxane with excellent photo-patterning and low dielectric properties

Juan Peng,
Chao Guo,
Xinyu Hu
et al.

Abstract: The photoresist is one of the key materials for the development of the modern semiconductor industry, which not only affects the chip manufacturing process but also has an important impact...

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