2013
DOI: 10.1016/j.egypro.2013.07.277
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Boron Laser Doping through High Quality Al2O3 Passivation Layer for Localized B-BSF PERL Solar Cells

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Cited by 7 publications
(3 citation statements)
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“…The dopant source can be gas, liquid, or solid [71]. Selective doping area, for example, selective emitter could be obtained by laser doping technology without the entire silicon substrate suffering from the high temperature process [72][73][74]. Along with its applications in laser texturing [75], laser ablation for contact opening [74] and laser-fired contact in solar cells [76,77], laser technique has a promising prospect in solar cells.…”
Section: Ibc Solar Cellmentioning
confidence: 99%
“…The dopant source can be gas, liquid, or solid [71]. Selective doping area, for example, selective emitter could be obtained by laser doping technology without the entire silicon substrate suffering from the high temperature process [72][73][74]. Along with its applications in laser texturing [75], laser ablation for contact opening [74] and laser-fired contact in solar cells [76,77], laser technique has a promising prospect in solar cells.…”
Section: Ibc Solar Cellmentioning
confidence: 99%
“…The PCE value was raised from 7 to 11%, using the hybrid SC, by considering the passivation layer. A heavily-doped Boron back surface field (B-BSF) structure has been proposed, that offered a better field-effect passivation than the conventional Al-BSF 29 , 30 . Zhang et al.…”
Section: Introductionmentioning
confidence: 99%
“…There are several approaches to boron LD, all of which showed that boron LD improves the cell efficiency. [23][24][25] Furthermore, boron LD can be applied with an IR laser and excimer laser to the rear side of PERL cells. [26][27][28][29] In this paper, we propose the fabrication of local boron BSF using NanoGram ® Si paste=ink and LD.…”
Section: Introductionmentioning
confidence: 99%