2018
DOI: 10.1557/mrc.2018.157
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Boron doping of ultrananocrystalline diamond films by thermal diffusion process

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Cited by 9 publications
(10 citation statements)
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“…The changes observed in the Raman spectra shown in Figure 1.14b are correlated mainly with changes in the grain boundary structure and chemistry of the UNCD films, mostly due to loss of TPA molecules and enhancement of sp 2 -C atom bonds induced by the B atoms' diffusion during annealing at temperatures !900 C [38,91]. The changes observed in the Raman spectra correlate with desorption of H atoms from grain boundaries and surfaces, as seen also for many polycrystalline and crystalline diamond films annealed at temperatures >800 C [38,92].…”
Section: Doping Of Uncd Films With Boron (B) Atoms To Produce B-uncd ...supporting
confidence: 56%
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“…The changes observed in the Raman spectra shown in Figure 1.14b are correlated mainly with changes in the grain boundary structure and chemistry of the UNCD films, mostly due to loss of TPA molecules and enhancement of sp 2 -C atom bonds induced by the B atoms' diffusion during annealing at temperatures !900 C [38,91]. The changes observed in the Raman spectra correlate with desorption of H atoms from grain boundaries and surfaces, as seen also for many polycrystalline and crystalline diamond films annealed at temperatures >800 C [38,92].…”
Section: Doping Of Uncd Films With Boron (B) Atoms To Produce B-uncd ...supporting
confidence: 56%
“…Alternatively, recent R&D work demonstrated a new process for B-doping of UNCD films, performed in a dedicated RTA system after growing UNCD films ($630 nm thick) on SiO 2 ($300 nm thick)/Si substrates using the MPCVD process in a dedicated system, as described above [38]. Subsequently, the UNCD films were coated with a spin-on-dopant (SOD) B-containing film (~200 nm thick), dispersed on the UNCD films' surface via a spinning speed of 3000 rpm.…”
Section: Doping Of Uncd Films With Boron (B) Atoms To Produce B-uncd ...mentioning
confidence: 99%
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“…It was also unclear whether this boron doping was substitutional, and how large the stress was, caused by this thermal diffusion process. To avoid the possible B contamination of the chamber, post-growth thermal diffusion has been demonstrated for the B-doping of UNCD films [31]. A commercial boron-containing spin-on-dopant (SOD) solution is spin-coated to form a 200-nm-thick film on the UNCD surface.…”
Section: Uncd Doping Techniquesmentioning
confidence: 99%
“…To avoid the possible B contamination of the chamber, post-growth thermal diffusion has been demonstrated for the B-doping of UNCD films [33]. A commercial boron-containing spin-on-dopant (SOD) solution is spin-coated to form a 200 nm thick film on UNCD surface.…”
Section: Synthesis Of Uncd Filmsmentioning
confidence: 99%