1981
DOI: 10.1021/ar00068a004
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Bond dissociation energy values in silicon-containing compounds and some of their implications

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Cited by 829 publications
(453 citation statements)
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References 38 publications
(4 reference statements)
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“…Moreover, comparing ceramics grafted by silanes possessing the same length of alkyl chains, higher CA value was found for C8Cl3 than for C8OEt3. This observation is related to the bond dissociation energy which is equal to 489.5 kJ mol −1 and 510.5 kJ mol −1 for Si-Cl and Si-OEt, respectively [60]. Similar relation was found for ceramic powders (TiO 2 and ZrO 2 ) modified by non-fluorinated compounds possessing various reactive groups (e.g., methoxy, ethoxy, and chlorine atoms) [44].…”
Section: Effectiveness Of Membrane Hydrophobizationsupporting
confidence: 67%
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“…Moreover, comparing ceramics grafted by silanes possessing the same length of alkyl chains, higher CA value was found for C8Cl3 than for C8OEt3. This observation is related to the bond dissociation energy which is equal to 489.5 kJ mol −1 and 510.5 kJ mol −1 for Si-Cl and Si-OEt, respectively [60]. Similar relation was found for ceramic powders (TiO 2 and ZrO 2 ) modified by non-fluorinated compounds possessing various reactive groups (e.g., methoxy, ethoxy, and chlorine atoms) [44].…”
Section: Effectiveness Of Membrane Hydrophobizationsupporting
confidence: 67%
“…This observation can be explain by a higher effectiveness of grafting comparing molecules with reactive groups of chlorine atoms and ethoxyl groups. As mentioned above, molecules with chlorine atoms are characterized by the highest ability to generate covalent bonds due to the lower value of energy bonds [60]. The membrane material as well as time of modification process affected the transport properties.…”
Section: Air-gap Membrane Distillation-separation Efficiency Of Modifmentioning
confidence: 99%
“…However, it would be naïve to perceive that alcohol would then proceed to etch the surface as in HF treatment. In the typical HF reaction to the surface, the Si-F bond energy is ~160 kcal mol −1 while the Si-O bond energy is 111 kcal mol −1 [31]. The electron pull from the Si-F forming to the surface is strong enough to result in the breakage of the subsequent Si-Si backbond and this ultimately results in the liberation of a single SiF4 from the silicon bulk material, hence creating the etching event.…”
Section: Resultsmentioning
confidence: 99%
“…Work on these two states includes the determination of ⌳-doubling transition frequencies for X 2 ⌸, 38,63,65,76 radiative lifetimes and oscillator strengths of the A 2 ⌬ϪX 2 ⌸ system, 43,45,47,61,64,74 various molecular constants, 55,56,67,72,78,79,84 transition moments, 66 ionization potentials, 55,80,81 and dissociation energies and enthalpies of formation. 55,59,64,68,80,81,83 To our knowledge, only a limited number of experimental papers deal with the higher excited states, but the extracted parameters useful to the present theoretical work are very few, limited mostly to term values. These papers include the work of Verma, 55 Herzberg et al, 60 Bollmark et al, 62 and Johnson and Hudgens.…”
Section: Introductionmentioning
confidence: 99%