Bond contribution model for the prediction of glass transition temperature in polyphenol molecular glass resists

Lawson, Richard A.; Yeh, Wei-Ming; Henderson, Clifford L.

doi:10.1116/1.3250264

Cited by 10 publications

(2 citation statements)

References 31 publications

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“…A key aim for the development of photoresists and associated processes is to simultaneously improve RLS. Many gains can be made by optimisation of resist formulations, although more disruptive technologies include the redesign of the resists and such approaches include: polymer bound PAG resists, [1][2][3][4][5][6][7] molecular glass resists [8][9][10][11][12][13][14][15][16] and chain scissioning resists. [17][18][19][20][21][22][23][24][25][26] In particular, polymer bound PAG resists have achieved a great deal of success as EUVL platforms, although improvements are still required for achieving the ITRS goals.…”

Section: Introductionmentioning

confidence: 99%

Extending the scope of poly(styrene)-block-poly(methyl methacrylate) for directed self-assembly

et al. 2014

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Directed self-assembly (DSA) is a promising technique for extending conventional lithographic techniques by being able to print features with critical dimensions under 10 nm. The most widely studied block copolymer system is polystyreneblock-polymethyl methacrylate (PS-b-PMMA). The system is well understood in terms of its synthesis, properties and performance in DSA. However, PS-b-PMMA also has a number of limitations that impact on its performance and hence scope of application. The primary limitation is the low Flory-Huggins polymer-polymer interaction parameter (χ), which limits the size of features that can be printed by DSA. Another issue with block copolymers in general is that specific molecular weights need to be synthesized to achieve desired morphologies and feature sizes. We are exploring blending ionic liquid additiveswithPS-b-PMMAto increase the χ parameter. This allows smaller feature sizes to be accessed by PS-b-PMMA. Depending on the amount of additive it is also possible to tune the domain size and the morphology of the systems. These findings may expand the scope of PS-b-PMMA for DSA.

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Section: Introductionmentioning

confidence: 99%

Extending the scope of poly(styrene)-block-poly(methyl methacrylate) for directed self-assembly

et al. 2014

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“…Apart from resist optimisation, more radical solutions include polymer bound PAG resists, [1][2][3][4][5][6][7] molecular glass resists [8][9][10][11][12][13][14][15][16] and chain scissioning resists. [17][18][19][20][21][22][23][24][25][26] Polymer bound PAG resists, in particular, have been successful in EUVL, although improvements are still required for achieving the ITRS goals.…”

Section: Introductionmentioning

confidence: 99%

Healing LER using directed self assembly: treatment of EUVL resists with aqueous solutions of block copolymers

Chuang

Cheng

Jack

et al. 2013

Alternative Lithographic Technologies V

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Overcoming the resolution-LER-sensitivity trade-off is a key challenge for the development of novel resists and processes that are able to achieve the ITRS targets for future lithography nodes. Here, we describe a process that treats lithographic patterns with aqueous solutions of block copolymers to facilitate a reduction in LER. A detailed understanding of parameters affecting adhesion and smoothing is gained by first investigating the behavior of the polymers on planar smooth and rough surfaces. Once healing was established in these model systems the methodology is tested on lithographically printed features where significant healing is observed, making this a promising technology for LER remediation.

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Overview of materials and processes for lithography

Lawson

Robinson

2016

Materials and Processes for Next Generation Lithography

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Bond contribution model for the prediction of glass transition temperature in polyphenol molecular glass resists

Abstract: Articles you may be interested inScaling of the hysteresis in the glass transition of glycerol with the temperature scanning rate Surface characterization of imprinted resist above glass transition temperature

Cited by 10 publications

References 31 publications

Extending the scope of poly(styrene)-block-poly(methyl methacrylate) for directed self-assembly

Extending the scope of poly(styrene)-block-poly(methyl methacrylate) for directed self-assembly

Healing LER using directed self assembly: treatment of EUVL resists with aqueous solutions of block copolymers

Overview of materials and processes for lithography

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