Complex Macromolecular Architectures 2011
DOI: 10.1002/9780470825150.ch25
|View full text |Cite
|
Sign up to set email alerts
|

Block Copolymer Nanostructured Thin Films for Advanced Patterning

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
4
1

Citation Types

0
5
0

Year Published

2012
2012
2016
2016

Publication Types

Select...
3

Relationship

0
3

Authors

Journals

citations
Cited by 3 publications
(5 citation statements)
references
References 108 publications
0
5
0
Order By: Relevance
“…Advances in novel manufacturing techniques on a nanoscale have relentlessly revolutionized the miniaturization of electronic circuitry and devices that impact countless aspects of modern life. Conventional top‐down lithographies suffer from inherent limitations for quick and reliable patterning beyond around 22 nm half pitch . The most recently released International Technology Roadmap for Semiconductors (ITRS) lithography outlined a technological pathway for the semiconductor industry .…”
Section: Metallopolymers In Nanofabrication and Nanomanufacturingmentioning
confidence: 99%
See 3 more Smart Citations
“…Advances in novel manufacturing techniques on a nanoscale have relentlessly revolutionized the miniaturization of electronic circuitry and devices that impact countless aspects of modern life. Conventional top‐down lithographies suffer from inherent limitations for quick and reliable patterning beyond around 22 nm half pitch . The most recently released International Technology Roadmap for Semiconductors (ITRS) lithography outlined a technological pathway for the semiconductor industry .…”
Section: Metallopolymers In Nanofabrication and Nanomanufacturingmentioning
confidence: 99%
“…The roadmap's technical pace typically shows companies meeting Moore's law. The current industrial grand challenge as identified by the ITRS is to achieve 16 nm half pitch, where block copolymer lithography and directed self‐assembly (DSA) are emerging from the research stage, demonstrating potential for very‐high‐resolution, large‐throughput patterning . Block copolymers tend to self‐assemble into a variety of ordered nanoscale morphologies, driven by the attractive (repulsive) interaction of like (dissimilar) blocks.…”
Section: Metallopolymers In Nanofabrication and Nanomanufacturingmentioning
confidence: 99%
See 2 more Smart Citations
“…Besides these metal-containing BCPs there are several other BCP microdomains confined within the surface topography in order to guide their selfassembly. 64,65 The specific interest in this particular class of metal-containing BCPs stems from its robustness against oxygen plasma, which is highly desirable for pattern transfer using these templated selfassembled patterns in BCP nanolithography. 66 Because the organometallic segment of PS-b-PFS copolymers contains Fe and Si, exposure to oxygen plasma results in a robust oxide barrier that imparts high etch selectivity between the blocks.…”
Section: Confined Assembly Of Block Copolymers (Bcps)mentioning
confidence: 99%