Bipolar pulse generator for intense pulsed ion beam accelerator

IEEE Trans. Plasma Sci.

Fujikawa

Miyake

et al. 2009

Self Cite

Intense pulsed heavy ion beam has been developed for a range of applications, including materials processing, particle accelerator injection for fundamental nuclear physics research, and other fundamental and applied purposes. For those applications, it is very important to generate high-purity ion beams with various ion species. We have developed a magnetically insulated ion diode for the generation of intense pulsed metallic ion beams in which the vacuum arc plasma gun is used as the metal ion source. The ion diode was operated at a diode voltage of about 200 kV, a diode current of about 15 kA, and a pulse duration of about 100 ns, and an ion beam with an ion current density of > 200 A/cm 2 and a pulse duration of 40 ns was obtained at 50 mm downstream from the anode. By evaluating the ion species and the energy spectrum of the ion beam via a Thomson parabola spectrometer, it was confirmed that the ion beam consists of aluminum ions (Al + , Al 2+ , and Al 3+ ) of energy 60-740 keV and proton impurities of energy 90-150 keV. The purity of the beam was estimated to be 89%, which is much higher than that of the pulsed ion beam produced in the conventional ion diode.Index Terms-Intense pulsed heavy ion beam, magnetically insulated ion diode (MID), pulsed power technology, vacuum arc plasma gun.

Section: Resultsmentioning

confidence: 99%

Characteristic Observation of Intense Pulsed Aluminum Ion Beam in Magnetically Insulated Ion Diode With Vacuum Arc Ion Source

IEEE Trans. Plasma Sci.

Fujikawa

Miyake

et al. 2009

Self Cite

“…18 FIG. However, there seems to be some room for making improvements in the beam quality such as the beam purity in order to apply the pulsed heavy ion beam to the semiconductor implantation.…”

Section: Resultsmentioning

confidence: 99%

Diagnosis of high-intensity pulsed heavy ion beam generated by a novel magnetically insulated diode with gas puff plasma gun

Review of Scientific Instruments

Miyake

Masugata

2008

Self Cite

Intense pulsed heavy ion beam is expected to be applied to materials processing including surface modification and ion implantation. For those applications, it is very important to generate high-purity ion beams with various ion species. For this purpose, we have developed a new type of a magnetically insulated ion diode with an active ion source of a gas puff plasma gun. When the ion diode was operated at a diode voltage of about 190 kV, a diode current of about 15 kA, and a pulse duration of about 100 ns, the ion beam with an ion current density of 54 A/cm(2) was obtained at 50 mm downstream from the anode. By evaluating the ion species and the energy spectrum of the ion beam via a Thomson parabola spectrometer, it was confirmed that the ion beam consists of nitrogen ions (N(+) and N(2+)) of energy of 100-400 keV and the proton impurities of energy of 90-200 keV. The purity of the beam was evaluated to be 94%. The high-purity pulsed nitrogen ion beam was successfully obtained by the developed ion diode system.

“…In this approach, ion implantation is accompanied with selective high-temperature annealing of the ion-implanted layer. Test devices were constructed with BPA as the acceleration power source (voltage: ±200 kV, pulse width: 70 ns [full width half maximum, FWHM]) and gas puff plasma gun used as the ion source, and preliminary experiments were conducted to verify the effectiveness of BPA [20,21]. Although hydrogen, aluminum, and other ion beams with purity about 90% were generated successfully, the beam purity is still insufficient for ion implantation, which requires ion beams with purity of 99% or higher.…”

Section: Introductionmentioning

confidence: 99%

“…Thus, bipolar pulse accelerator (BPA) [19] was proposed as a novel accelerator to further improve beam purity. Test devices were constructed with BPA as the acceleration power source (voltage: ±200 kV, pulse width: 70 ns [full width half maximum, FWHM]) and gas puff plasma gun used as the ion source, and preliminary experiments were conducted to verify the effectiveness of BPA [20,21]. In this study, we report the characteristics of pulsed ion beams using first pulse (negative pulse) of bipolar pulse voltage as the progress of BPA development.…”

Section: Introductionmentioning

confidence: 99%

Characteristics of Pulsed Heavy Ion Beam Generated in Bipolar Pulse Accelerator

Kitajima

2016

Elect Comm in Japan

We have developed a new type of a pulsed ion beam accelerator named "bipolar pulse accelerator" for improvement of the purity of the intense pulsed ion beam. The system utilizes a magnetically insulated accelerate on gap and was operated with the bipolar pulse. A coaxial gas puff plasma gun was used as an ion source, which was placed inside of the grounded anode. Source plasma (nitrogen) of current density of 30 A/cm 2 and pulse duration of 1.0 μs was injected into the acceleration gap. When the bipolar pulse of −114 kV, 70 ns (first pulse) and 85 kV, 62 ns (second pulse) was applied to the drift tube, the ions were successfully accelerated from the grounded anode to the drift tube in the first gap by the negative pulse of the bipolar pulse. The pulsed ion beam with current density of 60 A/cm 2 and pulse duration of 50 ns was obtained at 48 mm downstream from the anode surface. The energy spectrum of the ion beam was evaluated by a magnetic energy spectrometer. The ion energy was in reasonable good agreement with the acceleration voltage, that is, first pulse (negative pulse) voltage of the bipolar pulse. C⃝ 2016 Wiley Periodicals, Inc. Electron Comm Jpn, 99(9): 11-17, 2016; Published online in Wiley Online Library (wileyonlinelibrary.com).