“…[1][2][3] The advantages of LIL have been very simple, more effective to fabricate 1D, 2D, and 3D structure, less complicated compared to x-ray and e-beam systems, allows deposition or removal of material-high spatial accuracy and minimal damage to sample surface (narrow spectral bandwidth-high resolution), uses computer interface for controlling the wavelength . [4][5] It can be used as maskless lithography which involves direct writing or using imaging lens for projection. [6][7][8] The other part of LIL seems to has de-merit but practically cannot be considered as de-merit, i.e., maskless lithography projects a precise beam directly onto the wafer without using a mask, but it is not widely used for commercial processes.…”