Bioconcentration potential and microbial toxicity of onium cations in photoacid generators

Niu, Xi-Zhi; Field, Jim A.; Paniego, Rodrigo; Pepel, Richard D.; Chorover, Jon; Abrell, Leif; Sierra-Álvarez, Reyes

doi:10.1007/s11356-020-12250-5

Cited by 10 publications

(7 citation statements)

References 28 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Other chemicals of concern include Developer tetramethylammonium hydroxide which is toxic to marine life [228,229]. Photoacid generators (PAGs) are widely applied in photolithographic processes [230,231] There associated environmental toxicity, persistence, and bioaccumulation is of concern [230]. Photoresists and photostrippers are not required for BCP and polymer brush nanofabrication routes.…”

Section: Are There Environmental Incentives To Pursue the Alternative Lithography Strategies?mentioning

confidence: 99%

“…Wastes from photoresist and photostripper are of concern [34,180,228,230,231]. Photoresists after exposure to light decomposes into harmful chemicals [149].…”

Section: Photoresists Photostrippers Bcp and Polymer Brush Wastesmentioning

confidence: 99%

“…Persistent, bio accumulative, toxic and bio accumulative and thus of substantial environmental concern [219,229,230].…”

Section: Photoresists Photostrippers Bcp and Polymer Brush Wastesmentioning

confidence: 99%

See 2 more Smart Citations

Green Nanofabrication Opportunities in the Semiconductor Industry: A Life Cycle Perspective

Mullen

Morris

2021

Nanomaterials

View full text Add to dashboard Cite

The turn of the 21st century heralded in the semiconductor age alongside the Anthropocene epoch, characterised by the ever-increasing human impact on the environment. The ecological consequences of semiconductor chip manufacturing are the most predominant within the electronics industry. This is due to current reliance upon large amounts of solvents, acids and gases that have numerous toxicological impacts. Management and assessment of hazardous chemicals is complicated by trade secrets and continual rapid change in the electronic manufacturing process. Of the many subprocesses involved in chip manufacturing, lithographic processes are of particular concern. Current developments in bottom-up lithography, such as directed self-assembly (DSA) of block copolymers (BCPs), are being considered as a next-generation technology for semiconductor chip production. These nanofabrication techniques present a novel opportunity for improving the sustainability of lithography by reducing the number of processing steps, energy and chemical waste products involved. At present, to the extent of our knowledge, there is no published life cycle assessment (LCA) evaluating the environmental impact of new bottom-up lithography versus conventional lithographic techniques. Quantification of this impact is central to verifying whether these new nanofabrication routes can replace conventional deposition techniques in industry as a more environmentally friendly option.

show abstract

Section: Are There Environmental Incentives To Pursue the Alternative Lithography Strategies?mentioning

confidence: 99%

“…Wastes from photoresist and photostripper are of concern [34,180,228,230,231]. Photoresists after exposure to light decomposes into harmful chemicals [149].…”

Section: Photoresists Photostrippers Bcp and Polymer Brush Wastesmentioning

confidence: 99%

See 1 more Smart Citation

Green Nanofabrication Opportunities in the Semiconductor Industry: A Life Cycle Perspective

Mullen

Morris

2021

Nanomaterials

View full text Add to dashboard Cite

show abstract

“…9,10 However, type II PIS are generally not biocompatible because these systems incorporate toxic co-initiators (amines, onium salts, etc.). 11 Moreover, these co-initiators (and their byproducts reaction) are low-molecular-weight molecules that can easily leach out of the resulting polymers and may affect living cells in certain biological applications such as tissue engineering, cell encapsulation, etc. 12 Thus, there is a need for new PIS for visible light with no leachable components.…”

Section: ■ Introductionmentioning

confidence: 99%

Conjugated Polymer Nanoparticles as Visible Light Panchromatic Photoinitiators for 3D Printing of Acrylic Hydrogels

Cagnetta,

Gallastegui,

Martínez

et al. 2023

Macromolecules

View full text Add to dashboard Cite

Conjugated polymers (CPs) are known to generate radical reactive oxygen species (ROS) such as hydrogen peroxide through photoinduced charge transfer processes involving water. In this work, this ability to generate radicals is utilized here to use conducting polymer nanoparticles (CPNs) as photoinitiator systems (PIS) for the polymerization of acrylic monomers in aqueous media. The CPNs do not require co-initiators and also act as cross-linkers. CPNs with different light-absorption properties effectively initiate photopolymerization across the entire visible light spectrum, reaching high monomer conversion yields (60− 99%) under blue, green, or red LED exposure. The resulting hydrogels demonstrate remarkable characteristics, including a significant water absorption swelling capacity (900−1600%) and substantial gel formation percentages (70−97%). Notably, the CPNs are evenly dispersed within the hydrogel matrix after photopolymerization, maintaining their photophysical properties and their ability to generate reactive species, potentially rendering the hydrogel suitable for bacterial photodynamic inactivation. Furthermore, PIS CPNs enable 3D printing with a fine resolution of up to 100 μm using a digital light processing technique.

show abstract

“…Onium salt is an essential component of CP and FRPCP PISs [ 8 ] . However, various onium species, including diphenylene iodonium, triphenylphosphonium and triarylsulfonium [ 9 ] were reported to exhibit certain toxicity and/or antimicrobial activities. Therefore, the development of PISs with high efficiency, less toxicity and low cost is the focus of many academic and industrial researches.…”

Section: Introductionmentioning

confidence: 99%

Glycine ester ionic liquid as new co‐initiator used in initiating radical and cationic photopolymerization

Nan

Luo

et al. 2022

Polymer Engineering & Sci

View full text Add to dashboard Cite

Ionic liquids using amino acid ester as cations is a new generation of green ionic liquids. It is found for the first time that they can be used as co-initiators to initiate radical photopolymerization in the presence of commercial type II sensitizer, camphorquinone (CQ) under mild irradiation conditions. To intensively investigate this new function, we synthesized a series of glycine ester ionic liquids by a very simple method, and then evaluated their performance as co-initiators in radical photopolymerization. The polymerization studies show that their coinitiation abilities depend strongly on the structures of N-terminal substituents and ester groups, as well as the type of anion moiety. And the pH values of the formula also have a heavy influence on their performances. More interestingly, when a small amount of hydroxyethyl acrylate (HEA) was added, under irradiation this multicomponent system composed of CQ, ionic liquids when anion moiety is PF 6 À , BF 4 À or SbF 6 À , and HEA, can release H + to initiate cationic polymerization. These facts demonstrated that the investigated glycine ester ionic liquids can be considered as valid, environmentally friendly alternatives to toxic aromatic amines co-initiators. Besides, the corresponding photoinitiation mechanism is suggested.

show abstract

Bioconcentration potential and microbial toxicity of onium cations in photoacid generators

Cited by 10 publications

References 28 publications

Green Nanofabrication Opportunities in the Semiconductor Industry: A Life Cycle Perspective

Green Nanofabrication Opportunities in the Semiconductor Industry: A Life Cycle Perspective

Conjugated Polymer Nanoparticles as Visible Light Panchromatic Photoinitiators for 3D Printing of Acrylic Hydrogels

Glycine ester ionic liquid as new co‐initiator used in initiating radical and cationic photopolymerization

Contact Info

Product

Resources

About