Binder free and high performance of sputtered tungsten nitride thin film electrode for supercapacitor device

Prakash, Ravi; Kumar, Ashwani; Pandey, Akhilesh; Kaur, Davinder

doi:10.1016/j.ijhydene.2019.02.005

Cited by 53 publications

(21 citation statements)

References 58 publications

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“…However, the MnO 2 /graphite electrode showed poor rate capability. Overall, the 5 min electrode delivered higher capacitance with better rate capability than the 3 min electrode and is also comparable to and higher than the previous reports, including MnO 2 nanosheets@bamboo leaf carbon (76 F g −1 at 0.5 A g −1 in 1 M Na 2 SO 4 ), 59 tungsten nitride thin films ((163 F g −1 at 0.5 mA cm −2 in 1 M H 2 SO 4 ), 60 δ-MnO 2 (190 F g −1 at 0.25 A g −1 in 1 M Na 2 SO 4 ), 61 birnessite-type MnO 2 / carbon composite (114 F g −1 at 2 A g −1 in 2.5 M KNO 3 ), 62 MnO 2 /PIn nanocomposite (155 F g −1 at 1 A g −1 in 1 M KCl), 63 manganese nitride (118 mF cm −2 for KOH, 68 mF cm −2 for KCl and 27 mF cm −2 for Na 2 SO 4 at a scan rate of 10 mV/s), 64 manganese-cobalt oxide (11 and 9 mF cm −2 at 0.40 mA cm −2 in 1 M KOH), 65 MnO 2 −CuO−BaO (198 F g −1 at 10 mV s −1 in 1 M KOH), 66 NiO/MnO 2 /CNT (23 F g −1 at 0.1 A g −1 in 1 M KOH), 55 and MnO 2 particles on the surface of hollow porous carbon nanospheres (198 F g −1 at 1 A g −1 in 1 M Na 2 SO 4 ). 67 To evaluate the resistance at the electrode/electrolyte interface of the electroactive material, an EIS measurement was performed.…”

Section: ■ Results and Discussionsupporting

confidence: 83%

Flexible, Lightweight, and Ultrabendable RuO₂–MnO₂/Graphite Sheets for Supercapacitors

et al. 2022

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In the present work, we have introduced lightweight, ultrabendable, rough graphite sheets on a polyimide tape substrate as a current collector. The flexible current collector was fabricated by the peel-off method. The as-prepared graphite-sheetcoated polyimide substrate is ultraflexible (bendable, rollable, and twistable), thin, and lightweight, has better conductivity, high mechanical durability, and ease of fabrication, and is cost-effective, rough, and environment friendly. The fabricated flexible current collector could be directly used as the substrate for constructing RuO 2 −MnO 2 /graphite flexible supercapacitors. The as-prepared electrode delivered a maximum gravimetric capacitance of 183 F g −1 (73.5 mF cm −2 ) at a current density of 1 A g −1 with better rate capability and 96% capacitance retention (after 5000 cycles). The better electrochemical performance of the electrode is due to the rough surface and good electrical conductivity of the current collector leads to the better attachment of active material and rapid ions/electron transfer.

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Section: ■ Results and Discussionsupporting

confidence: 83%

Flexible, Lightweight, and Ultrabendable RuO₂–MnO₂/Graphite Sheets for Supercapacitors

et al. 2022

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“…8 f). These results proved to be much higher than previously reported nitride-based electrodes: CrN [ 36 ], Mn 3 N 2 [ 57 ], Co 3 N [ 62 ], Nb 4 N 5 [ 63 ], TiN [ 64 ], HfN [ 65 ], GaN [ 66 ], VN [ 67 ] and W 2 N [ 68 ]. As doping concentration of Cr increased, areal capacity values increased, with respect to various current densities.…”

Section: Resultsmentioning

confidence: 60%

Sputter-Deposited Binder-Free Nanopyramidal Cr/γ-Mo2N TFEs for High-Performance Supercapacitors

et al. 2022

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Due to their outstanding power density, long cycle life and low cost, supercapacitors have gained much interest. As for supercapacitor electrodes, molybdenum nitrides show promising potential. Molybdenum nitrides, however, are mainly prepared as nanopowders via a chemical route and require binders for the manufacture of electrodes. Such electrodes can impair the performance of supercapacitors. Herein, binder-free chromium (Cr)-doped molybdenum nitride (Mo2N) TFEs having different Cr concentrations are prepared via a reactive co-sputtering technique. The Cr-doped Mo2N films prepared have a cubic phase structure of γ-Mo2N with a minor shift in the (111) plane. While un-doped Mo2N films exhibit a spherical morphology, Cr-doped Mo2N films demonstrate a clear pyramid-like surface morphology. The developed Cr-doped Mo2N films contain 0–7.9 at.% of Cr in Mo2N lattice. A supercapacitor using a Cr-doped Mo2N electrode having the highest concentration of Cr reveals maximum areal capacity of 2780 mC/cm2, which is much higher than that of an un-doped Mo2N electrode (110 mC/cm2). Furthermore, the Cr-doped Mo2N electrode demonstrates excellent cycling stability, achieving ~ 94.6% capacity retention for about 2000 cycles. The reactive co-sputtering proves to be a suitable technique for fabrication of binder-free TFEs for high-performance energy storage device applications. Graphical Abstract

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“…[292] 3.9.2. Applications of WN Thin Films WN finds its applications in electronic industry as a coating material in supercapacitors, [293,294] diffusion barriers, [295] semiconductors, [296,297] etc. Because of its high melting point, it is considered as a promising refractory material.…”

Section: Experimental Conditionmentioning

confidence: 99%

Magnetron Sputtered Thin Films Based on Transition Metal Nitride: Structure and Properties

Bharani

Sharma

2022

Physica Status Solidi (a)

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Transition metal nitride (TMN) thin films exhibit outstanding physical, chemical, and mechanical properties, making them best suitable for a wide variety of applications. The most commonly used technique to produce metal nitride thin films with specific properties at optimum conditions is magnetron sputtering. Considering this, this review begins with advancements in the sputtering process from basic diode sputtering to the most commonly used pulsed magnetron sputtering. Further, the literature on several TMNs deposited via magnetron sputtering is summarized, referring to several articles that have been published during the last decades. The main emphasis lies on nitride-based thin films' structural, morphological, and mechanical aspects for various applications. In addition, the influence of reactive gas flow rate, substrate temperature, layer thickness, postannealing temperature, substrate bias voltage, protective layers, the sputtering technique adopted, etc. on the quality and performance of the thin films is also focused. The overall review work can be beneficial for the students and researchers in understanding the basic sputtering phenomenon with its advancements, the relationship between deposition parameters and surface properties, and to know the current research trend for exploring several research gaps in the literature.

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Binder free and high performance of sputtered tungsten nitride thin film electrode for supercapacitor device

Cited by 53 publications

References 58 publications

Flexible, Lightweight, and Ultrabendable RuO₂–MnO₂/Graphite Sheets for Supercapacitors

Flexible, Lightweight, and Ultrabendable RuO₂–MnO₂/Graphite Sheets for Supercapacitors

Sputter-Deposited Binder-Free Nanopyramidal Cr/γ-Mo2N TFEs for High-Performance Supercapacitors

Magnetron Sputtered Thin Films Based on Transition Metal Nitride: Structure and Properties

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Binder free and high performance of sputtered tungsten nitride thin film electrode for supercapacitor device

Cited by 53 publications

References 58 publications

Flexible, Lightweight, and Ultrabendable RuO2–MnO2/Graphite Sheets for Supercapacitors

Flexible, Lightweight, and Ultrabendable RuO2–MnO2/Graphite Sheets for Supercapacitors

Sputter-Deposited Binder-Free Nanopyramidal Cr/γ-Mo2N TFEs for High-Performance Supercapacitors

Magnetron Sputtered Thin Films Based on Transition Metal Nitride: Structure and Properties

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Product

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Flexible, Lightweight, and Ultrabendable RuO₂–MnO₂/Graphite Sheets for Supercapacitors

Flexible, Lightweight, and Ultrabendable RuO₂–MnO₂/Graphite Sheets for Supercapacitors