Binary Self-Assembly of Nanocolloidal Arrays using Concurrent and Sequential Spin Coating Techniques

Abstract

This paper reports the binary colloid assembly of nanospheres using spin coating techniques. Polystyrene spheres with sizes of 900 and 100 nm were assembled on top of silicon substrates utilizing a spin coater. Two different spin coating processes, namely concurrent and sequential coatings, were employed. For the concurrent spin coating, 900 and 100 nm colloidal nanospheres of latex were first mixed and then simultaneously spin coated onto the silicon substrate. On the other hand, the sequential coating process first created a monolayer of a 900 nm nanosphere array on the silicon substrate, followed by the spin coating of another layer of a 100 nm colloidal array on top of the 900 nm array. The influence of the processing parameters, including the type of surfactant, spin speed, and spin time, on the self-assembly of the binary colloidal array were explored. The empirical outcomes show that by employing the optimal processing conditions, binary colloidal arrays can be achieved by both the concurrent and sequential spin coating processes.

Research on Broadband Matching Method for Capacitive Micromachined Ultrasonic Transducers Based on PDMS/TiO2 Particles

“…The packaging steps for covering the surface of CMUT chip with 0-3 composite material of 200 µm thickness are shown in Figure 10. In the first step, the 0-3 composite material was prepared, and the surface of the CMUT membrane was covered with the rotary coating process [39]. The CMUT device was placed in the homogenizer, and an appropriate amount of 0-3 composite material was dropped in the center of the membrane.…”