2010
DOI: 10.1209/0295-5075/90/46002
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Bimodal range distributions of low-energy carbon ions in tetrahedral amorphous carbon

Abstract: Range and mixing distributions of carbon ions deposited onto tetrahedral amorphous carbon films at kinetic energies between 22 eV and 692 eV are measured utilizing high-resolution elastic recoil detection. These data are compared to respective calculations based on binary collision approximation as well as to classical molecular-dynamics simulations. The measured range profiles reveal asymmetric, bimodal structures which are not reproduced from theories. The measured mixing distributions approve the measured r… Show more

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Cited by 4 publications
(3 citation statements)
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“…The growth by subimplantation (chapter 2.2) causes an intermixing at the interfaces. The mixing range is in the order of 1 nm to 2 nm in accordance with experiments by Neumaier et al [49]. The TEM image suggests a slight intermixing at the interfaces as well, the width is about 2 nm being in accordance to the findings of Neumaier et al and SRIM simulations.…”
Section: Tem Characterizationsupporting
confidence: 91%
See 1 more Smart Citation
“…The growth by subimplantation (chapter 2.2) causes an intermixing at the interfaces. The mixing range is in the order of 1 nm to 2 nm in accordance with experiments by Neumaier et al [49]. The TEM image suggests a slight intermixing at the interfaces as well, the width is about 2 nm being in accordance to the findings of Neumaier et al and SRIM simulations.…”
Section: Tem Characterizationsupporting
confidence: 91%
“…The carbon ions with 20 eV to 200 eV have a range of 0.5 nm to 1.5 nm according to SRIM [48]. An in-depth study of ion range during a-C deposition has been performed by Neumaier et al [49]. The energy is mainly lost by nuclear stopping (chapter 2.…”
Section: Growth Model and Amorphous Carbon Depositionmentioning
confidence: 99%
“…Taking gold ions bombarding an a-C:Au film with a gold concentration of 20 at.% as an example yields the following: 100 eV Au + ions penetrate about 1.3 nm with a straggling of 0.5 nm while 20 eV ions still have an ion range of 0.9(3) nm. Although SRIM was developed for ion implantation, the calculated ion ranges for low-energy ions are reasonably accurate [113]. Furthermore, the focus here is not on the exact values but on the comparison, which in the example above results in a factor of only 1.4 in the ion ranges.…”
Section: Msibd Versus R-msd Processesmentioning
confidence: 99%