Bimodal ion energy distribution functions in a hydrogen magnetized plasma

A review of the last ten years of advances in temporal resolved plasma diagnostics for pulsed operated 2.45 GHz microwave-driven hydrogen discharges is presented. Special attention has been paid to the study of breakdown and decay processes where some particular phenomena are explored for application in ion sources. Measurements of plasma temperature and density using vacuum ultraviolet spectroscopy, ultra-fast photography, and ion mass spectroscopy are performed in detail, including examples and results.

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Ion concentration ratio measurements of ion beams generated by a commercial microwave electron cyclotron resonance plasma source

Abe,

Koel

2023

Review of Scientific Instruments

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A commercially available electron cyclotron resonance (ECR) plasma source (GenII Plasma Source, tectra GmbH) is widely used for surface processing. This plasma source is compatible with ultrahigh vacuum systems, and its working pressure is relatively low, around 10−6–10−4 Torr even without differential pumping. Here, we report ion flux concentration ratios for each ion species in an ion beam from this source, as measured by a mass/energy analyzer that is a combination of a quadrupole mass spectrometer, an electrostatic energy analyzer, and focusing ion optics. The examined beams were those arising from plasmas produced from feed gases of H2, D2, N2, O2, Ar, and dry air over a range of input power and working pressures. H2(D2) plasmas are widely used for nuclear fusion applications and, hence, the ion concentration ratios of H+, H2+, and H3+ reported here will be useful information for research that applies this plasma source to well-controlled plasma-material interaction studies. Ion energy distributions, stability of operation, and impurity concentrations were also assessed for each of the plasma species investigated.

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Bimodal ion energy distribution functions in a hydrogen magnetized plasma

Cited by 4 publications

References 30 publications

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Effect of Deposition Power on DLC Structure on Alumina in RF-Biased Inductively Coupled Plasma

Time resolved plasma diagnostics for pulsed 2.45 GHz hydrogen discharges

Ion concentration ratio measurements of ion beams generated by a commercial microwave electron cyclotron resonance plasma source

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