“…For comparison purposes, the LSV and Tafel data for the state-of-the-art Pt/C electrocatalyst were also measured, as shown in Figure . To benchmark the HER performance of our ALD NiSe 2 with those NiSe 2 made by other methods (e.g., solution methods or NiO selenization ,,− ), the turnover frequency (TOF) was evaluated, as it reflects the intrinsic activity of a catalyst. − As the lower limit, the number of TOF was evaluated assuming that all of the Ni atoms in the film were catalytically active. ,, Therefore, the TOFs of the ALD NiSe 2 were calculated to be 0.109 and 0.53 s –1 at the overpotentials of 300 and 400 mV, respectively, and these numbers are quite comparable to those NiSe 2 made by other methods (Table S1), ,,− which indicates that our ALD NiSe 2 had good intrinsic HER activity. As ALD technology is renowned for uniform film coating on 3D structures with exceptional conformality, we envision that the ALD of MSe 2 will have great applications toward constructing superior 3D nanostructured electrocatalysts.…”