The combined temporally, spatially and spectrally-resolved optical techniques, namely the photoluminescence, light induced transient grating, and differential reflectivity were used for investigation of excitation-dependent PL efficiency, exciton lifetime, and diffusion coefficient in Si-doped Al-rich multiple quantum wells and epilayers at various temperatures. Novel features of carrier recombination and in-plane diffusion were observed. Low-excitation radiative lifetime of 1-2 ns was found temperature-independent in 80-150 K interval, while it sublinearly decreased with excitation at excess carrier densities above 10 18 cm À3 . The lifetime decrease correlated with the increase of diffusion coefficient, indicating excitation-enhanced delocalization of localized excitons and therefore enhanced capture to nonradiative centers. The droop of photoluminescence efficiency with excitation was the strongest at 80-150 K due to strong delocalisation at low-temperatures, while at higher temperatures the thermal activation prevailed in photoluminescence excitation dependence. The photoluminescence efficiency quenching at T > 200 K provided rather high activation energies of $100 and 160 meV for Al-rich multiple quantum wells and epilayers, correspondingly.