2008 IEEE Bipolar/BiCMOS Circuits and Technology Meeting 2008
DOI: 10.1109/bipol.2008.4662720
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BiCMOS technology improvements for microwave application

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Cited by 50 publications
(24 citation statements)
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“…The first gain stage has been realized using a 0.25μm SiGe:C BiCMOS technology with a bipolar cut-off frequency (ft) of 216GHz (QuBIC4Xi) [6]. The current gain is close to 2000, which almost eliminates the base current shot noise and makes the device rather similar to a GaAs FET in terms of noise performance.…”
Section: B Used Si Technologiesmentioning
confidence: 99%
“…The first gain stage has been realized using a 0.25μm SiGe:C BiCMOS technology with a bipolar cut-off frequency (ft) of 216GHz (QuBIC4Xi) [6]. The current gain is close to 2000, which almost eliminates the base current shot noise and makes the device rather similar to a GaAs FET in terms of noise performance.…”
Section: B Used Si Technologiesmentioning
confidence: 99%
“…The LNA's are fabricated in a 0.25J.lm SiGe: C BiCMOS technology which features peak ftlfmax of 2161177 GHz [6] and a minimum NF of about 0.9 dB at 20 GHz. The chip micrograph is shown in Fig.…”
Section: Measurementsmentioning
confidence: 99%
“…The K-band controlled variable attenuator is designed with a NXP in house BiCMOS process (0.25μm CMOS, 140 GHz Ft Heterojunction Bipolar Transistor) [8].…”
Section: A Requirementsmentioning
confidence: 99%