2021
DOI: 10.1016/j.tsf.2021.138844
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Beyond surface nanoindentation: Combining static and dynamic nanoindentation to assess intrinsic mechanical properties of chemical vapor deposition amorphous silicon oxide (SiOx) and silicon oxycarbide (SiOxCy) thin films

Abstract: HAL is a multi-disciplinary open access archive for the deposit and dissemination of scientific research documents, whether they are published or not. The documents may come from teaching and research institutions in France or abroad, or from public or private research centers. L'archive ouverte pluridisciplinaire HAL, est destinée au dépôt et à la diffusion de documents scientifiques de niveau recherche, publiés ou non, émanant des établissements d'enseignement et de recherche français ou étrangers, des labor… Show more

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“…Additionally, a depth-related analysis was performed by dynamic indentation tests where the load was varied sinusoidally with a 0.5 mN amplitude in the range of 7–40 mN. The intrinsic film properties were evaluated by subtracting the substrate contribution through the application of the Song–Phar model as described in ref . Dynamic indentation associated with models can accurately evaluate films with an expanded range of thickness, with a 50 nm thickness threshold.…”
Section: Methodsmentioning
confidence: 99%
“…Additionally, a depth-related analysis was performed by dynamic indentation tests where the load was varied sinusoidally with a 0.5 mN amplitude in the range of 7–40 mN. The intrinsic film properties were evaluated by subtracting the substrate contribution through the application of the Song–Phar model as described in ref . Dynamic indentation associated with models can accurately evaluate films with an expanded range of thickness, with a 50 nm thickness threshold.…”
Section: Methodsmentioning
confidence: 99%