Abstract:In this paper, we present a benchmarking study of directed self-assembly (DSA) and self-aligned multiple patterning (SAMP) techniques for potential applications in manufacturing 10-nm (half-pitch) IC devices. Using the self-aligned quadruple patterning (SAQP) process as an example, we compare their process characteristics and complexity/costs, identify the integration challenges, and propose various patterning solutions for both BEOL and FEOL applications. Major differences in DSA and SAQP mask strategy, layou… Show more
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