2007
DOI: 10.1117/1.2743657
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Benchmark study of run-to-run controllers for the lithographic control of the critical dimension

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Cited by 3 publications
(1 citation statement)
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“…Some authors [4][5][6][7][8] have addressed this problem in their studies by proposing a self-tuning EWMA controller which dynamically updates its controller parameters. Performance and stability analyses of single-input/single-output (SISO) and multi-input/multi-output (MIMO) EWMA controllers in RtR process control have also been proposed by other authors [9][10][11][12][13][14][15][16]. In addition the high-mixed production issues in the control of semiconductor manufacturing processes that use the EWMA controller and its extension have been discussed by other authors [17][18][19].…”
Section: Introductionmentioning
confidence: 99%
“…Some authors [4][5][6][7][8] have addressed this problem in their studies by proposing a self-tuning EWMA controller which dynamically updates its controller parameters. Performance and stability analyses of single-input/single-output (SISO) and multi-input/multi-output (MIMO) EWMA controllers in RtR process control have also been proposed by other authors [9][10][11][12][13][14][15][16]. In addition the high-mixed production issues in the control of semiconductor manufacturing processes that use the EWMA controller and its extension have been discussed by other authors [17][18][19].…”
Section: Introductionmentioning
confidence: 99%