Abstract:Die fluoorradikale wat in ’n nie-termiese CF4-radiofrekwensieplasma (glimontladingsplasma) opgewek word, reageer geredelik met silikoonkarbied (SiC) met die vorming van vlugtige SiF4 en CF4. In ’n spuitbedopstelling wat hier gebruik word, bewerkstellig dit binne 14 tot 15 h die volledige verwydering van die SiC-deklaag vanaf TRISO-partikels, met uitstekende beheer oor die proses vir analitiese en kwaliteitsbeheerdoeleindes. Die proseskinetika word deur massa-oordrag beheer.
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