Use of thin, nearly intrinsically doped Si electrodes having
implanted, interdigitated n+ and p+ back
contact
points has allowed electrical control over the potential of either
electrons or holes in the solid. During potential
control at the n+ point contacts, the open-circuit
potential of holes could be monitored, while during
potential
control of the p+ point contacts, the open-circuit
potential of electrons was measured. In combination
with
current density−voltage measurements of either electrons or holes
passing through the back contact points,
these data allowed a comparison of the behavior of a given carrier type
when generated by an applied bias
(i.e., as majority carriers) relative to their behavior when generated
with band gap illumination of the solid
(as minority carriers). Data have been collected for
Si/CH3OH junctions having
1,1‘-dimethylferrocene+/0,
decamethylferrocene+/0, methyl
viologen2+/+, and cobaltocene+/0 as
redox couples. These data have been
used to validate certain key predictions of the quasi-Fermi level
concept in photoelectrochemistry. In addition,
digital simulations that include two-dimensional representations of the
charge density distribution and of the
current fluxes in the solid have been utilized to provide a
quantitative understanding of the observed
experimental behavior.