2010
DOI: 10.1016/j.electacta.2010.01.058
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Behavior of alumina barrier layer in the supporting electrolytes for deposition of nanowired materials

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Cited by 7 publications
(8 citation statements)
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“…Large number of experimental facts proves this point of view. Anodic alumina films formed in oxalic acid contain a huge number of oxalate species incorporated into the bulk of films that can influence its properties [7][8][9]. The most intensive luminescence is observed in anodic alumina films formed in organic acids [2] which is contrary to the suggestion that the photoluminescence may be caused by the lattice defects (oxygen vacancies).…”
Section: Introductioncontrasting
confidence: 58%
“…Large number of experimental facts proves this point of view. Anodic alumina films formed in oxalic acid contain a huge number of oxalate species incorporated into the bulk of films that can influence its properties [7][8][9]. The most intensive luminescence is observed in anodic alumina films formed in organic acids [2] which is contrary to the suggestion that the photoluminescence may be caused by the lattice defects (oxygen vacancies).…”
Section: Introductioncontrasting
confidence: 58%
“…This value is in good agreement with that found in EIS measurements but smaller than that cited by other authors (1 nm/V, 1.4 nm/V). 6,38,41 This may be due to a little alteration of the barrier layer thickness during EIS measurements. Indeed, several studies were reported on the barrier layer thinning during AC treatment and pulse electrodeposition.…”
Section: Scmentioning
confidence: 99%
“…The changes were related with the transport of protons through the barrier layer, discharge at the metal/oxide interface and hydrogenation of alumina material by hydrogen atoms in an upward way. 6 Apart from their microstructural characteristics, the physicochemical properties of the porous oxide films on alumina have also been a subject of intense interest and continue to be a subject of numerous investigations. The current understanding of porous oxide layer results from the use of various in situ and ex situ techniques.…”
mentioning
confidence: 99%
“…Surface engineering of aluminum and porous anodic alumina (PAA) films grown by anodic oxidation (anodizing) of aluminum have been of increasing interest for lithography‐free templating of metals, dielectrics, and semiconductors . PAA‐assisted anodization of certain valve metals sputtered on substrates, including tungsten, has proven its potential as a reproducible method for electrochemically forming self‐organized vertically aligned spatially separated 1D nanostructures (nanocolumns, rods, or tubes), being nearly ideally electrically and mechanically bonded at their bottoms either to the substrate metal or to a continuous solid layer of similar metal oxide that grows at the columns/substrate‐metal interface .…”
Section: Introductionmentioning
confidence: 99%