1987
DOI: 10.1088/0031-8949/1987/t17/015
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Basic Formulae of XUV Multilayer Optics

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Cited by 58 publications
(46 citation statements)
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“…at energies between roughly 100 and 1500 eV. Unfortunately, the spectral resolution of ML mirrors in this regime is inherently limited by absorption of the fluorescent x-rays that need to be analyzed [4][5][6][7]. Although the natural line widths of fluorescent x-rays are typically E/ΔE ≈ 1000 [8], closely spaced lines could often not be distinguished due to the limited resolution of the analyzing optical element.…”
Section: Motivationmentioning
confidence: 99%
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“…at energies between roughly 100 and 1500 eV. Unfortunately, the spectral resolution of ML mirrors in this regime is inherently limited by absorption of the fluorescent x-rays that need to be analyzed [4][5][6][7]. Although the natural line widths of fluorescent x-rays are typically E/ΔE ≈ 1000 [8], closely spaced lines could often not be distinguished due to the limited resolution of the analyzing optical element.…”
Section: Motivationmentioning
confidence: 99%
“…From this figure, it can easily be seen that silicon is an excellent candidate as low-Z material. The optimal high-Z material can then be chosen by maximizing the modulation-over-absorption ratio Λ = Re| A − S |/Im( A ), where is the dielectric constant given by n = √ [4]. This is demonstrated in figure 1.2b for the SXR energy of 1 keV and assuming silicon to be the spacer layer.…”
Section: Multilayer Mirrorsmentioning
confidence: 99%
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