Azide‐phenolic resin UV resist (MRL) for microlithography

Abstract

Poly(4-vinylphenol) sensitized by an aromatic monoazide compound (4-azidochalcone), called MRL (Micro Resist for Longer wavelengths), has been prepared and evaluated as a negative UV resist. The resist is sensitive to radiation in the 300 to 400 nm region. The sensitivity of MRL is comparable to that of a positive quinonediazide photoresist under exposure to unfiltered light from a high pressure Hg lamp. An aqueous base developer removes the unexposed areas of MRL with no evidence of swelling of the exposed areas, indicating its high resolution capability. The main products in the exposure of MRL films are found to be primary and secondary amines. It is concluded that the formation of secondary amines attached to the polymer chain is responsible for the insolubilization of the exposed MRL in the base developer.

High-Resolution Negative Photoresists Composed of Phenolic Resin and Aromatic Azide

“…The resist comprising poly(vinylphenol) and azide II was named MRL, 3 which is an abbreviation of Micro Resist for Longer wavelength. As seen in Figure 1, this resist strongly absorbs the light in near UV region, especially i line (at 365 nm) of mercury arc.…”

Development of high‐definition aqueous polyvinylpyrrolidone photoresists for cathode ray tubes

“…The polymer portions of these photoresists from the literature are cyclized polyisoprene, 8 poly(vinylphenol), 9 and polymethyl methacrylate. 10 However, the only commercially available diazide photoactivator was DAS, which has been used with PVP, which is water soluble.…”

Thermolysis of an Azide‐Phenolic Resin Composite Film and Its Use as an Antireflective Bottom Layer in the Three‐Layer Resist Process

“…This effect was demonstrated using moleeular beam epitaxy (MBE) to grow very thin (5-36 nm) Be counterdoped layers on n-GaAs (100) (6,7). These studies indicated Sehottky barrier enhancement up to 0.5 eV.…”

“…During our study on negative photoresists consisting of photosensitive aromatic azide compounds and phenolic resins (6,7), azides have been found to decompose in phenolic resin matrices upon heating as well as upon UV exposure (8,9), The main products from thermolysis or photolysis of the azide-phenolic resin composite films are primary and secondary amines which cause the red shift in their UV-visible absorption spectra. The amines * Electrochemical Society Active Member.…”