2010 IEEE Instrumentation &Amp; Measurement Technology Conference Proceedings 2010
DOI: 10.1109/imtc.2010.5488012
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Automatic Defect Cluster Extraction for Semiconductor Wafers

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Cited by 15 publications
(3 citation statements)
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“…It is therefore important to identify the defects in the wafer early in the manufacturing process so that the process can be improved to reduce time and yield loss. It has been observed that the defects generally occur in clusters in a wafer in certain locations (Ooi et al, 2010). A kernel‐based method to detect such clusters is proposed in Sumikawa, Nero, and Wang (2017).…”
Section: Yield Learning and Diagnosismentioning
confidence: 99%
“…It is therefore important to identify the defects in the wafer early in the manufacturing process so that the process can be improved to reduce time and yield loss. It has been observed that the defects generally occur in clusters in a wafer in certain locations (Ooi et al, 2010). A kernel‐based method to detect such clusters is proposed in Sumikawa, Nero, and Wang (2017).…”
Section: Yield Learning and Diagnosismentioning
confidence: 99%
“…The mainstream research on WBM analysis has focused on the discovery of meaningful patterns or clusters from bad wafers. In this framework, bad wafers are manually filtered first, and then various analytical techniques are applied to find significant patterns or clusters based on their WBMs [16][17][18][19][20]. In the early 2000s, Huang et al [16] found wafer clusters by applying a 3 × 3 median filter to the WBM to replace isolated chips with the median value of neighboring chips.…”
Section: Literature Reviewmentioning
confidence: 99%
“…In the 2010s, Ooi et al [18] proposed the segmentation with detection and small cluster removal (SDC) algorithm. The SDC algorithm automatically generated features for clustering WBMs by local yield conversion (LYC) method, which extracted the mean value of the "passed" and "failed" neighboring chips around the targeted chip.…”
Section: Literature Reviewmentioning
confidence: 99%