“…Therefore, it is important to characterize dislocations in SiC wafers. Among various kinds of characterization methods, including X-ray topography, photoluminescence imaging and molten potassium hydroxide (KOH) etching (Dudley et al, 2003;Tajima et al, 2006;Katsuno et al, 1999), birefringence imaging using polarized light is a promising method for nondestructive characterization of SiC wafers (Ma et al, 2002;Ouisse et al, 2010;McGuire et al, 2018;Kawata et al, 2021). Birefringence image contrast of dislocations in various kinds of crystals has been investigated since the first observation of the stress field of dislocations in Si by Bond and Andrus (Bond & Andrus, 1956;Bullough, 1958;Maiwa et al, 1989;Ming & Ge, 1990;Hoa et al, 2014;Tanaka et al, 2019).…”