Automated Defect and Correlation Length Analysis of Block Copolymer Thin Film Nanopatterns

Murphy, Jeffrey J.; Harris, Kenneth D. M.; Buriak, Jillian M.

doi:10.1371/journal.pone.0133088

Cited by 60 publications

(87 citation statements)

References 77 publications

(104 reference statements)

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“…Although, the use of FLA to achieve the SA of BCPs has not yet demonstrated, FLA could represent an interesting development of the RTP-based process. Figure 9 shows the topological defects typically encountered in self-assembled DBC thin films with cylinders parallel oriented with respect to the substrate [91]. The elementary defect components are classified in junctions, terminal points, and dots and they exist in the positive phase (PDMS parallel cylinders) and negative Figure 9.…”

Section: Discussionmentioning

confidence: 99%

“…The elementary defect components are classified in junctions, terminal points, and dots and they exist in the positive phase (PDMS parallel cylinders) and negative Figure 9. scheme and top-view seM images of topological defects in self-assembled PdMs cylinders (white phase) embedded in a Ps matrix (black phase), adapted from [91].…”

Section: Discussionmentioning

confidence: 99%

“…Figure 10 reports the data available in literature concerning the evolution of defect density (D) as a function of the annealing time (t) for RTP [69], SVA [77,89], and PDMS gel pad [88] methods. Data for the RTP method were extracted from SEM images of flat substrates using the procedure described in the literature [91] while all the other data reflect the evolution of defect density in topographically defined patterns having the same dimensions (width = 1 μm, depth = 40 nm). Actually, the comparison of defect density evolution as function of annealing time on a flat surface and within topographical patterns is not formally correct because the mechanisms of defect annihilation are expected to be remarkably different in the two cases [93].…”

Section: Discussionmentioning

confidence: 99%

“…LER and LWR represent the deviation from a straight line edge, and the deviation from a uniform line width, respectively, as depicted in Figure 11(a) and (b), [91]. According to ITRS [4], LER and LWR of sub-10 nm nanostructures are requested to be lower than 0.6 and 0.8 nm, respectively, because higher values could be highly detrimental for the performance of the resulting microelectronics devices [94][95][96][97].…”

Section: Discussionmentioning

confidence: 99%

“…In case of iDSA [87] and RTP [69] methods, experimental LER and LWR values are almost twice the Figure 11. sketch of the LeR (a) and LWR (b) adapted from [91]. LeR and LWR values for various annealing methods that include idsA [87], PdMs gel pad [88], Wsc [86], conventional Thermal annealing (TA) [86], svA at room temperature (RT) [86], svA-thermal at 85 °c [77], RTP at 310 °c [69].…”

Section: Discussionmentioning

confidence: 99%

See 4 more Smart Citations

Technological strategies for self-assembly of PS-b-PDMS in cylindrical sub-10 nm nanostructures for lithographic applications

Giammaria

Laus

Perego³

2018

Advances in Physics: X

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The continuous demand for small portable electronics is pushing the semiconductor industry to develop novel lithographic methods to fabricate the elementary structures for microelectronics devices with dimensions below 10 nm. Topdown strategies include multiple patterning photolithography, extreme ultraviolet lithography (EUVL), electron beam lithography (EBL), and nanoimprint lithography. Bottom-up approaches mainly rely on block copolymers (BCPs) self-assembly (SA). SA of BCPs is extremely appealing due to its excellent compatibility with conventional photolithographic processes, high-resolution patterns, and low process costs. Among the various BCPs, the polystyrene-b-polydimethylsiloxane (PS-b-PDMS) represents the most investigated material for the fabrication of sub-10 nm structures. However, PS-b-PDMS cannot be easily processed by conventional thermal treatments due to its slow SA kinetic coupled with a relatively low thermal stability. This review focuses on the available annealing methods to promote the SA PS-b-PDMS in parallel-oriented cylindrical sub-10 nm structures. Moreover, literature data regarding the annealing time, defects density, line edge roughness (LER) and line width roughness (LWR) are discussed with reference to the stringent requirements of semiconductor technology.

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Section: Discussionmentioning

confidence: 99%

Section: Discussionmentioning

confidence: 99%

Section: Discussionmentioning

confidence: 99%

Section: Discussionmentioning

confidence: 99%

Section: Discussionmentioning

confidence: 99%

See 3 more Smart Citations

Technological strategies for self-assembly of PS-b-PDMS in cylindrical sub-10 nm nanostructures for lithographic applications

Giammaria

Laus

Perego³

2018

Advances in Physics: X

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Machine Learning Predictions of Block Copolymer Self‐Assembly

Huang

Lee

et al. 2020

Advanced Materials

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Directed self‐assembly of block copolymers is a key enabler for nanofabrication of devices with sub‐10 nm feature sizes, allowing patterning far below the resolution limit of conventional photolithography. Among all the process steps involved in block copolymer self‐assembly, solvent annealing plays a dominant role in determining the film morphology and pattern quality, yet the interplay of the multiple parameters during solvent annealing, including the initial thickness, swelling, time, and solvent ratio, makes it difficult to predict and control the resultant self‐assembled pattern. Here, machine learning tools are applied to analyze the solvent annealing process and predict the effect of process parameters on morphology and defectivity. Two neural networks are constructed and trained, yielding accurate prediction of the final morphology in agreement with experimental data. A ridge regression model is constructed to identify the critical parameters that determine the quality of line/space patterns. These results illustrate the potential of machine learning to inform nanomanufacturing processes.

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Orbital Angular Momentum from Self‐Assembled Concentric Nanoparticle Rings

et al. 2021

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Some of these limitations-in particular, fabrication of small features and complex geometries-have been addressed with a hybrid approach, where simple lithographic templates guide the self-assembly of finer features. [1][2][3][4][5] Directed self-assembly (DSA) of block copolymers (BCPs) has successfully produced a variety of functional nanodevices, including capacitors, memory storage, and photonic crystals. [6][7][8] DSA of curved features, however, has not achieved the same level of success, despite the technological importance of ring and concentric ring patterns. Ring-based devices include zone plates, nanolenses, and optical ring resonators; certain memory storage devices, transistors, and sensors also use nanoscale ring features. [9][10][11][12][13][14][15] Compared to assembly along linear patterns, DSA of curved nanostructures has distinct requirements. In order for a lamellar or cylindrical BCP microdomain to form a ring, the polymer chains need to compress along the microdomain's inner edge and stretch along its outer edge. [16,17] This asymmetric distortion is energetically unfavorable. In solution, spontaneous formation of rings or toroids requires that the BCP blocks be chemically modified to experience self-attraction. [18,19] BCP rings and spirals have been observed within cylindrical confinement, though only a narrow set of BCP block ratios have been studied. [20][21][22][23] The confined BCP assemblies often exhibit structural degeneracy, typical of a system trapped far away from its free energy minimum state.Polymer nanostructures typically serve as etching masks for inorganic materials with the requisite electronic, magnetic, or optical properties. Alternatively, BCPs and inorganic nanoparticles (NPs) can be blended into nanocomposites, which offer additional advantages, including single-step fabrication and nanoparticle size-and arrangement-dependent properties. [24][25][26][27][28] Indeed, ordered nanocomposites with longrange alignment across one, two, and three dimensions have been obtained with DSA. However, curved features have been notably absent. Incorporated particles increase the bending moduli of their host microdomains, and thus increase the energy penalty associated with curved features. [29,30] To assemble successfully, the polymer matrix must accommodate Ring-shaped nanostructures can focus, filter, and manipulate electromagnetic waves, but are challenging to incorporate into devices using standard nanofabrication techniques. Directed self-assembly (DSA) of block copolymers (BCPs) on lithographically patterned templates has successfully been used to fabricate concentric rings and spirals as etching masks. However, this method is limited by BCP phase behavior and material selection. Here, a straightforward approach to generate ring-shaped nanoparticle assemblies in thin films of supramolecular nanocomposites is demonstrated. DSA is used to guide the formation of concentric rings with radii spanning 150-1150 nm and ring widths spanning 30-60 nm. When plasmonic nanoparticles are us...

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Automated Defect and Correlation Length Analysis of Block Copolymer Thin Film Nanopatterns

Cited by 60 publications

References 77 publications

Technological strategies for self-assembly of PS-b-PDMS in cylindrical sub-10 nm nanostructures for lithographic applications

Technological strategies for self-assembly of PS-b-PDMS in cylindrical sub-10 nm nanostructures for lithographic applications

Machine Learning Predictions of Block Copolymer Self‐Assembly

Orbital Angular Momentum from Self‐Assembled Concentric Nanoparticle Rings

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