1993
DOI: 10.1109/33.232058
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Au-In bonding below the eutectic temperature

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Cited by 119 publications
(46 citation statements)
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“…The temperature was raised to 250 • C over the course of approximately 10 minutes, while pressure was applied to various parts of the wafer stack. The wafers are then cooled to room temperature over the course of [154,155]. Because the melting points of the resulting eutectic alloys are greater than 450 • C (see Fig.…”
Section: In-au Reactive Bondingmentioning
confidence: 99%
“…The temperature was raised to 250 • C over the course of approximately 10 minutes, while pressure was applied to various parts of the wafer stack. The wafers are then cooled to room temperature over the course of [154,155]. Because the melting points of the resulting eutectic alloys are greater than 450 • C (see Fig.…”
Section: In-au Reactive Bondingmentioning
confidence: 99%
“…Several bonding techniques are available and we highlight eutectic and direct bonding as the most suitable methods due to their low outgassing and high hermeticity, with anodic bonding as a suitable alternative if the oxygen released during bonding can be pumped away. Lowering the temperatures of these bonding techniques should be investigated as they can reduce the outgassing limitations by two or three orders of magnitude 171,174,175,181,[243][244][245][246][247][248] .…”
Section: E Vacuum Discussionmentioning
confidence: 99%
“…Moreover, thin films, such as gold on silicon, can diffuse at moderate temperatures if additional barrier layers are not used 170 . In these situations one must use lower temperature degassing, such as UV desorption or plasma cleaning, and also develop lower temperature bonding methods 171,174,175,181,[243][244][245][246][247][248] .…”
Section: Discussionmentioning
confidence: 99%
“…We have developed fluxless bonding processes involving In with In-Ag, In-Au, and In-Sn systems. [2][3][4][5] In these fluxless processes, a thin outer Ag or Au capping layer is used in solder manufacturing to prevent indium oxidation. The multilayer solder structures can then be fabricated using vacuum deposition techniques or electroplating processes.…”
Section: Introductionmentioning
confidence: 99%