2005
DOI: 10.1149/1.1887185
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Au-Cu Ohmic Contacts for p + GaAs

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Cited by 5 publications
(2 citation statements)
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“…As presented in Table I, all the reflectors showed low contact resistivity of the order of 10 À6 XÁcm 2 , which are lower than reported contact resistivities of non-alloyed contacts. 27 These results show that an ohmic contact is formed even without annealing due to high doping in the GaAs layer and high reflectivity of the metal reflector is retained.…”
Section: à3mentioning
confidence: 79%
See 1 more Smart Citation
“…As presented in Table I, all the reflectors showed low contact resistivity of the order of 10 À6 XÁcm 2 , which are lower than reported contact resistivities of non-alloyed contacts. 27 These results show that an ohmic contact is formed even without annealing due to high doping in the GaAs layer and high reflectivity of the metal reflector is retained.…”
Section: à3mentioning
confidence: 79%
“…20 Typical contact resistivities for p-GaAs are of the order of 10 À5 XÁcm 2 for non-alloyed metal contacts and 10 À7 XÁcm 2 for alloyed ones. 26,27 The contact resistivity of the Ag/Cu back contact reflectors was measured using the Transmission Line Method (TLM). The contact pads for TLM were fabricated by photolithography onto a separately grown p-type GaAs layer that had a doping level of $10 20 cm…”
Section: -2mentioning
confidence: 99%