2000
DOI: 10.1039/b001094o
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Atomistic simulation methodologies for modelling the nucleation, growth and structure of interfaces

Abstract: There have been many studies applying atomistic simulation techniques to investigate the structure and energetics of surfaces and interfaces. Almost all start by de®ning the basic structure of the interface, which is then simulated by static or dynamical methods. A different approach is adopted here, where we allow interfacial structures to evolve during the course of the simulation. In particular, three atomistic simulation methodologies for constructing models for thin ®lm interfaces have been developed, inc… Show more

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Cited by 23 publications
(27 citation statements)
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“…It is also probable that, in this case, the film thickness is not sufficient to induce strain responsible for the formation of misfit dislocations at the interface. As shown in Figure , the MgO/CaO(001) interface shows cracks and islanding within the MgO thin film after the deposition of four MgO layers onto the CaO support. Lattice misfit between the two incommensurable materials was held accountable for the observed islands.…”
Section: Computational Studies Focused On Semi‐coherent Oxide/oxide Hmentioning
confidence: 95%
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“…It is also probable that, in this case, the film thickness is not sufficient to induce strain responsible for the formation of misfit dislocations at the interface. As shown in Figure , the MgO/CaO(001) interface shows cracks and islanding within the MgO thin film after the deposition of four MgO layers onto the CaO support. Lattice misfit between the two incommensurable materials was held accountable for the observed islands.…”
Section: Computational Studies Focused On Semi‐coherent Oxide/oxide Hmentioning
confidence: 95%
“…Sayle and co‐workers utilized complementary atomistic simulation methodologies for modeling the nucleation, growth, and structure of oxide interfaces and thin films. Specifically, three atomistic simulation methodologies for constructing models for thin film interfaces were developed: i) atom deposition, where the thin film is grown by sequentially depositing atoms onto a support material to obtain information on nucleation and growth mechanisms; ii) layer‐by‐layer growth, where monatomic layers of a material are successively deposited on top of a substrate surface; iii) cube‐on‐cube, whereby the thin film is placed directly on top of the substrate, before dynamical simulation and energy minimization . In this last method, one limitation is that the system is constrained so that respective counterions are on top of each other across the interface.…”
Section: Computational Studies Focused On Semi‐coherent Oxide/oxide Hmentioning
confidence: 99%
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“…This is because the fabrication of many novel materials requires the ability to exercise precise control over the growth of precipitates in a host material or in thin films on a host substrate or of precipitates in a host [2,3], in crystallisation processes [4], in preparation of nanoparticles [5,6], in isothermal austenite decomposition in nearly eutectoid steel [7], etc. Accordingly, also the theory itself has been discussed a lot (e.g.…”
Section: Introductionmentioning
confidence: 99%
“…To our knowledge, this is the first atomistic model for the interface region between ionic conductor and insulator grains [19]. Metal-oxide interfaces and insulator-insulator oxide interfaces have been studied be-fore with slab models at density-functional theory level and with classical force-fields [21,22].…”
mentioning
confidence: 99%