2008
DOI: 10.1016/j.tsf.2007.11.015
|View full text |Cite
|
Sign up to set email alerts
|

Atomistic basis for continuum growth equation: Description of morphological evolution of GaAs during molecular beam epitaxy

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
2
1

Citation Types

0
14
0

Year Published

2009
2009
2024
2024

Publication Types

Select...
5
2

Relationship

0
7

Authors

Journals

citations
Cited by 17 publications
(14 citation statements)
references
References 69 publications
0
14
0
Order By: Relevance
“…Vanishingly small or negative ES barriers, which imply that adatoms travelling toward descending steps are more likely to be incorporated at terrace positions adjacent to step edges rather than being reflected toward the island interior, and/or negative attachment energies [see Fig. 4(a)], which favor condensation of itinerant adatoms at ascending terrace step edges, promote surface smoothing during deposition via step-flow growth [95]. The existence of negative ES barriers for itinerant Ga adatoms has been proposed as a plausible explanation for stable homoepitaxial growth of GaAs crystals [95][96][97].…”
Section: K Dft + Neb Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…Vanishingly small or negative ES barriers, which imply that adatoms travelling toward descending steps are more likely to be incorporated at terrace positions adjacent to step edges rather than being reflected toward the island interior, and/or negative attachment energies [see Fig. 4(a)], which favor condensation of itinerant adatoms at ascending terrace step edges, promote surface smoothing during deposition via step-flow growth [95]. The existence of negative ES barriers for itinerant Ga adatoms has been proposed as a plausible explanation for stable homoepitaxial growth of GaAs crystals [95][96][97].…”
Section: K Dft + Neb Resultsmentioning
confidence: 99%
“…4(a)], which favor condensation of itinerant adatoms at ascending terrace step edges, promote surface smoothing during deposition via step-flow growth [95]. The existence of negative ES barriers for itinerant Ga adatoms has been proposed as a plausible explanation for stable homoepitaxial growth of GaAs crystals [95][96][97]. Our results confirm that the global activation energy for adatom descent is not necessarily larger than the activation energy for migration on an island, as conventional schematic representations of Ehrlich barriers would suggest [see, for example, Fig.…”
Section: K Dft + Neb Resultsmentioning
confidence: 99%
“…In such cases, R can be approximately taken as the actual thickness of that layer. Although originally inspired in continuum descriptions of macroscopic pattern formation on granular systems (aeolian and underwater sand dunes), analogous two-field descriptions have been also employed for nanoscopic systems, such as, for example, growth by MBE (see [20] for a review).…”
Section: Introductionmentioning
confidence: 99%
“…The situation of disregarding other data in presenting one's own experimental results can occur even when the investigators are working on the same topic. For example, in the homoepitaxial growth on the GaAs(001) substrate, as pointed out by Tiedje and Ballestad [28], Cho [29] had experimentally demonstrated that the homoepitaxial growth of GaAs(001) with a planar growing surface is highly stable in the early 1970s, while Johnson et al [30][31][32] interpreted their experimental results on the GaAs(001) homoepitaxial growth in terms of the growth instability due to the kinetic roughening effect in the 1990s. Cho's result is currently regarded as classical, whereas the work of Johnson et al has frequently been cited positively in the GaAs(001) homoepitaxy community to date.…”
Section: Formation Of Inas Qds Is Difficult To Understandmentioning
confidence: 99%